| 2022/0384,192 | EPITAXIAL GROWTH DEVICE | Jun 10, 22 | Dec 01, 22 | Not available |
| 2022/0319,851 | EPITAXIAL SILICON WAFER FOR MANUFACTURING SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING EPITAXIAL SILICON WAFER FOR MANUFACTURING SEMICONDUCTOR DEVICE | Jun 24, 22 | Oct 06, 22 | Sumco Corporation |
| 2022/0205,137 | SILICON CARBIDE SINGLE CRYSTAL MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING SILICON CARBIDE SINGLE CRYSTAL | Dec 27, 21 | Jun 30, 22 | EC-Showa Denko K.K. |
| 2022/0181,156 | SiC EPITAXIAL SUBSTRATE MANUFACTURING METHOD AND MANUFACTURING DEVICE THEREFOR | Mar 03, 20 | Jun 09, 22 | Not available |
| 2022/0148,889 | METHOD AND/OR SYSTEM FOR COATING A SUBSTRATE | Oct 29, 21 | May 12, 22 | Not available |
| 2022/0059,350 | SOURCE/DRAIN STRUCTURE FOR SEMICONDUCTOR DEVICE | Aug 18, 20 | Feb 24, 22 | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 2022/0044,934 | METHOD FOR MANUFACTURING SILICON CARBIDE EPITAXIAL SUBSTRATE | Aug 08, 19 | Feb 10, 22 | Not available |
| 2022/0005,696 | SiC EPITAXIAL GROWTH APPARATUS | Sep 16, 21 | Jan 06, 22 | Not available |
| 2020/0335,342 | METHODS FOR DEPOSITING THIN FILMS COMPRISING INDIUM NITRIDE BY ATOMIC LAYER DEPOSITION | Jun 22, 20 | Oct 22, 20 | Not available |
| 2020/0098,567 | OPTICAL SEMICONDUCTOR ELEMENT AND METHOD OF MANUFACTURING THE SAME | Sep 16, 19 | Mar 26, 20 | Sumitomo Electric Industries Ltd. |
| 2020/0051,817 | EPITAXIAL SILICON WAFER AND METHOD FOR MANUFACTURING EPITAXIAL SILICON WAFER | Sep 12, 17 | Feb 13, 20 | Sumco Corporation |
| 2019/0360,119 | GROUP 13 ELEMENT NITRIDE CRYSTAL SUBSTRATE AND FUNCTION ELEMENT | May 29, 18 | Nov 28, 19 | Not available |
| 2019/0228,972 | MANUFACTURING METHOD OF NITRIDE SEMICONDUCTOR ULTRAVIOLET LIGHT EMITTING ELEMENT, AND NITRIDE SEMICONDUCTOR ULTRAVIOLET LIGHT EMITTING ELEMENT | Nov 08, 17 | Jul 25, 19 | Soko Kagaku Co., Ltd. |
| 2019/0206,686 | COMPONENT FOR FABRICATING SIC SEMICONDUCTOR, HAVING PLURALITY OF LAYERS HAVING DIFFERENT TRANSMITTANCES, AND METHOD FOR MANUFACTURING SAME | Aug 18, 17 | Jul 04, 19 | TOKAI CARBON KOREA CO., LTD. |
| 2019/0206,685 | VAPOR PHASE GROWTH APPARATUS, METHOD OF MANUFACTURING EPITAXIAL WAFER, AND ATTACHMENT FOR VAPOR PHASE GROWTH APPARATUS | Jul 06, 17 | Jul 04, 19 | Not available |
| 2019/0103,273 | Method for Producing Group III Nitride Laminate | Mar 15, 17 | Apr 04, 19 | Stanley Electric Co., Ltd. |
| 2019/0088,477 | SEMICONDUCTOR STACK | Aug 10, 16 | Mar 21, 19 | Not available |
| 2018/0247,817 | EPITAXIAL SUBSTRATE FOR SEMICONDUCTOR ELEMENTS, SEMICONDUCTOR ELEMENT, AND MANUFACTURING METHOD FOR EPITAXIAL SUBSTRATES FOR SEMICONDUCTOR ELEMENTS | Apr 27, 18 | Aug 30, 18 | Not available |
| 2018/0237,942 | METHOD FOR MANUFACTURING SILICON CARBIDE EPITAXIAL SUBSTRATE, METHOD FOR MANUFACTURING SILICON CARBIDE SEMICONDUCTOR DEVICE, AND APPARATUS FOR MANUFACTURING SILICON CARBIDE EPITAXIAL SUBSTRATE | Aug 02, 16 | Aug 23, 18 | Not available |
| 2018/0218,905 | APPLYING EQUALIZED PLASMA COUPLING DESIGN FOR MURA FREE SUSCEPTOR | Jan 30, 18 | Aug 02, 18 | Not available |