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| 2025/0116,936 | PHOTOCURABLE RESIN COMPOSITION CONTAINING SELF-CROSSLINKABLE POLYMER | Feb 21, 23 | Apr 10, 25 | Nissan Chemical Corporation |
| 2025/0116,937 | LITHOGRAPHY PROCESS | Oct 04, 23 | Apr 10, 25 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 2025/0118,555 | SELECTIVE PASSIVATION OF PHOTORESISTS | Oct 10, 23 | Apr 10, 25 | Not available |
| 2025/0118,556 | METHOD FOR FORMING DEPOSITION FILM | Oct 07, 22 | Apr 10, 25 | Resonac Corporation |
| 2025/0118,557 | SELECTIVE HARDMASK ETCH FOR SEMICONDUCTOR PROCESSING | Oct 05, 23 | Apr 10, 25 | Applied Materials Inc. |
| 2025/0115,691 | METHOD OF FORMING PATTERNS | Dec 16, 24 | Apr 10, 25 | Not available |
| 2025/0120,157 | SEMICONDUCTOR DEVICE WITH SLANTED FIELD PLATE | Mar 19, 24 | Apr 10, 25 | Not available |
| 2025/0112,044 | MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | Dec 12, 24 | Apr 03, 25 | Not available |
| 2025/0112,045 | DRY DEVELOPMENT OF RESISTS | Dec 13, 24 | Apr 03, 25 | Lam Research Corporation |
| 2025/0109,242 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM CONTAINING HYDROXYCINNAMIC ACID DERIVATIVE | Oct 17, 22 | Apr 03, 25 | Nissan Chemical Corporation |
| 2025/0110,402 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVING UNSATURATED BOND AND CYCLIC STRUCTURE | Feb 17, 23 | Apr 03, 25 | Nissan Chemical Corporation |
| 2025/0110,407 | SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD, AND RESIST BASE FILM FORMING COMPOSITION | Oct 09, 24 | Apr 03, 25 | JSR Corporation |
| 2025/0102,907 | SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | May 28, 24 | Mar 27, 25 | Not available |
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| 2025/0102,913 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND | Jan 17, 23 | Mar 27, 25 | Not available |
| 2025/0102,914 | PHOTORESIST COMPOSITIONS INCLUDING A SULFONATE GROUP AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME | Apr 18, 24 | Mar 27, 25 | Not available |
| 2025/0102,916 | Photoresist and Method | Dec 09, 24 | Mar 27, 25 | Not available |
| 2025/0102,918 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | Apr 26, 22 | Mar 27, 25 | Not available |
| 2025/0102,922 | Exposure method of semiconductor pattern | Oct 22, 23 | Mar 27, 25 | United Microelectronics Corp. |