| 2025/0116,920 | ELECTROCONDUCTIVE-FILM-COATED SUBSTRATE AND REFLECTIVE MASK BLANK | Dec 16, 24 | Apr 10, 25 | AGC Inc. |
| 2025/0036,020 | REFLECTIVE MASK BLANK, REFLECTIVE MASK BLANK MANUFACTURING METHOD, REFLECTIVE MASK, AND REFLECTIVE MASK MANUFACTURING METHOD | Oct 09, 24 | Jan 30, 25 | AGC Inc. |
| 2025/0036,021 | EXTREME ULTRAVIOLET LITHOGRAPHY METHOD AND EUV PHOTOMASK | Jul 28, 23 | Jan 30, 25 | Not available |
| 2024/0411,219 | REFLECTIVE PHOTOMASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASK | May 28, 24 | Dec 12, 24 | Shin-Etsu Chemical Co., Ltd. |
| 2024/0393,674 | METHODS FOR FORMING EXTREME ULTRAVIOLET MASK COMPRISING MAGNETIC MATERIAL | Jul 30, 24 | Nov 28, 24 | Not available |
| 2024/0385,507 | MASK DEFECT PREVENTION | Jul 29, 24 | Nov 21, 24 | Not available |
| 2024/0385,506 | EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF | Jul 29, 24 | Nov 21, 24 | Taiwan Semiconductor Manufacturing Company Ltd. |
| 2024/0377,719 | SUBSTRATE WITH MULTILAYER REFLECTIVE FILM REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | Sep 22, 22 | Nov 14, 24 | 501 Hoya Corporation |
| 2024/0377,720 | EUV Lithography Mask With A Porous Reflective Multilayer Structure | Jul 22, 24 | Nov 14, 24 | Not available |
| 2024/0377,722 | MASK AND METHOD OF FORMING THE SAME | Jul 22, 24 | Nov 14, 24 | Taiwan Semiconductor Manufacturing Company Ltd. |
| 2024/0319,582 | Optical Component with Apodized Mask | Mar 08, 24 | Sep 26, 24 | Not available |
| 2024/0288,763 | REFLECTIVE PHOTOMASK AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASK | Jun 02, 22 | Aug 29, 24 | Not available |
| 2024/0280,890 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD OF MANUFACTURING REFLECTIVE MASK | Apr 29, 24 | Aug 22, 24 | AGC Inc. |
| 2024/0248,388 | Substrate with Film for Reflective Mask Blank, and Reflective Mask Blank | Nov 09, 23 | Jul 25, 24 | Shin-Etsu Chemical Co., Ltd. |
| 2024/0241,434 | PHOTOMASKS HAVING INTERMEDIATE BARRIER LAYERS | Mar 28, 24 | Jul 18, 24 | Not available |
| 2024/0219,824 | REFLECTIVE MASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND A METHOD OF FABRICATING A SEMICONDUCTOR DEVICE USING THE SAME | Oct 25, 23 | Jul 04, 24 | Not available |
| 2024/0219,844 | METHOD AND APPARATUS FOR DETERMINING OPTICAL PROPERTIES OF DEPOSITION MATERIALS USED FOR LITHOGRAPHIC MASKS | Jan 30, 24 | Jul 04, 24 | Not available |
| 2024/0176,226 | METHOD FOR FABRICATING EUV MASK AND PHOTOMASK USING THE EUV MASK | Feb 05, 24 | May 30, 24 | Not available |
| 2024/0176,225 | REFLECTIVE MASK BLANK AND REFLECTIVE MASK | Jan 19, 24 | May 30, 24 | AGC INC. |
| 2024/0142,866 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD FOR MANUFACTURING REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | Mar 25, 22 | May 02, 24 | 501 Hoya Corporation |