| 2025/0060,661 | SUBSTRATE COMPRISING A TARGET ARRANGEMENT, ASSOCIATED PATTERNING DEVICE AND METROLOGY METHOD | Nov 28, 22 | Feb 20, 25 | ASML Netherlands B.V. |
| 2024/0411,221 | PHOTOMASK SET, DESIGN METHOD THEREOF, AND MANUFACTURING METHOD OF PHOTORESIST PATTERN | Jul 03, 23 | Dec 12, 24 | United Microelectronics Corp. |
| 2024/0329,518 | PHOTOMASK CREATING METHOD, DATA CREATING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD | Jun 14, 24 | Oct 03, 24 | Gigaphoton Inc. |
| 2024/0310,721 | METHOD AND APPARATUS FOR CALIBRATING AN OPERATION ON A PHOTOMASK | May 17, 24 | Sep 19, 24 | Not available |
| 2024/0302,733 | RETICLE-LIKE SENSING ASSEMBLY | Jan 16, 24 | Sep 12, 24 | Not available |
| 2024/0304,445 | PHOTOMASK STRUCTURE AND PATTERNING METHOD | Dec 25, 23 | Sep 12, 24 | WINBOND ELECTRONICS CORP. |
| 2024/0282,647 | CLUSTERED IC DIES TO INCREASE IC DIES PER WAFER | Feb 21, 23 | Aug 22, 24 | Not available |
| 2024/0248,392 | ENFORCING MASK SYNTHESIS CONSISTENCY ACROSS RANDOM AREAS OF INTEGRATED CIRCUIT CHIPS | Apr 03, 24 | Jul 25, 24 | Not available |
| 2024/0241,451 | METHOD OF MEASURING OVERLAY AND SEMICONDUCTOR DEVICE MANUFACTURED USING THE SAME | Dec 05, 23 | Jul 18, 24 | Not available |
| 2024/0241,455 | ELECTRONIC DEVICE | Dec 14, 23 | Jul 18, 24 | Chimei Innolux Corporation |
| 2024/0220,695 | METHODS FOR MODELING OF A DESIGN IN RETICLE ENHANCEMENT TECHNOLOGY | Mar 15, 24 | Jul 04, 24 | D2S, Inc. |
| 2024/0192,583 | PHOTOMASK INCLUDING MONITORING MARK | Aug 23, 23 | Jun 13, 24 | Not available |
| 2024/0176,228 | METHOD AND DEVICE FOR OPTIMIZING MASK PARAMETERS | Nov 08, 21 | May 30, 24 | Institute of Microelectronics, Chinese Academy of Sciences |
| 2024/0142,959 | METHOD FOR DECOUPLING SOURCES OF VARIATION RELATED TO SEMICONDUCTOR MANUFACTURING | Jan 08, 24 | May 02, 24 | ASML Netherlands B.V. |
| 2024/0118,606 | IMPROVED TARGETS FOR DIFFRACTION-BASED OVERLAY ERROR METROLOGY | Oct 06, 22 | Apr 11, 24 | Not available |
| 2024/0094,625 | PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK | Nov 29, 23 | Mar 21, 24 | Not available |
| 2024/0085,778 | PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME | May 16, 23 | Mar 14, 24 | Not available |
| 2024/0085,779 | METHOD AND APPARATUS FOR QUALIFYING A MASK FOR USE IN LITHOGRAPHY | Sep 08, 23 | Mar 14, 24 | Not available |
| 2024/0086,607 | MODELING OF A DESIGN IN RETICLE ENHANCEMENT TECHNOLOGY | Nov 20, 23 | Mar 14, 24 | D2S, Inc. |
| 2024/0077,799 | METHOD FOR CORRECTING LITHOGRAPHY PATTERN OF SURFACE PLASMA | Nov 02, 21 | Mar 07, 24 | Not available |