| 2025/0116,941 | STITCHING METHOD FOR EXPOSURE PROCESS | Nov 14, 23 | Apr 10, 25 | Powerchip Semiconductor Manufacturing Corporation; AP Memory Technology Corporation; |
| 2025/0096,146 | PHOTOLITHOGRAPHY METHOD AND STRUCTURES THEREOF | Jan 24, 24 | Mar 20, 25 | Not available |
| 2025/0060,660 | LITHOGRAPHY MASK HAVING OVERLAY MARK AND RELATED METHOD | Jan 03, 24 | Feb 20, 25 | Not available |
| 2024/0411,221 | PHOTOMASK SET, DESIGN METHOD THEREOF, AND MANUFACTURING METHOD OF PHOTORESIST PATTERN | Jul 03, 23 | Dec 12, 24 | United Microelectronics Corp. |
| 2024/0411,223 | METHOD FOR PROCESSING DC MARKS FOR REPAIRING LITHOGRAPHY MASKS | Jun 06, 24 | Dec 12, 24 | Not available |
| 2024/0377,755 | MULTIPLE-MASK MULTIPLE-EXPOSURE LITHOGRAPHY AND MASKS | Jul 22, 24 | Nov 14, 24 | Not available |
| 2024/0369,919 | PATTERNING DEVICE FOR A LITHOGRAPHIC APPARATUS AND METHOD | Mar 09, 22 | Nov 07, 24 | ASML Netherlands B.V. |
| 2024/0361,350 | PARTICLE IMAGE VELOCIMETRY OF EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEMS | Jul 11, 24 | Oct 31, 24 | Taiwan Semiconductor Manufacturing Company Ltd. |
| 2024/0345,470 | MASK, EXPOSURE METHOD AND TOUCH PANEL | Jun 25, 24 | Oct 17, 24 | Not available |
| 2024/0310,722 | METHODS AND APPARATUSES FOR PROCESSING A LITHOGRAPHIC OBJECT | May 20, 24 | Sep 19, 24 | Not available |
| 2024/0241,451 | METHOD OF MEASURING OVERLAY AND SEMICONDUCTOR DEVICE MANUFACTURED USING THE SAME | Dec 05, 23 | Jul 18, 24 | Not available |
| 2024/0219,848 | EXTREME ULTRAVIOLET EXPOSURE APPARATUS INCLUDING A MASK STAGE | Nov 27, 23 | Jul 04, 24 | Not available |
| 2024/0203,796 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | Nov 14, 23 | Jun 20, 24 | Not available |
| 2024/0186,258 | PHOTOLITHOGRAPHY ALIGNMENT PROCESS FOR BONDED WAFERS | Jan 24, 24 | Jun 06, 24 | Not available |
| 2024/0170,504 | PHOTOMASK, DISPLAY DEVICE, AND MANUFACTURING METHOD THEREOF | Jan 25, 24 | May 23, 24 | Not available |
| 2024/0162,142 | DIAGONAL VIA MANUFACTURING METHOD | Jan 24, 24 | May 16, 24 | Not available |
| 2024/0094,624 | PATTERN FORMATION METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND IMPRINT APPARATUS | Aug 29, 23 | Mar 21, 24 | Not available |
| 2024/0094,625 | PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK | Nov 29, 23 | Mar 21, 24 | Not available |
| 2024/0085,776 | PHOTOLITHOGRAPHY MASK AND PHOTOLITHOGRAPHY SYSTEM COMPRISING SAID PHOTOLITHOGRAPHY MASK | Mar 31, 22 | Mar 14, 24 | Not available |
| 2024/0085,778 | PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME | May 16, 23 | Mar 14, 24 | Not available |