| 2025/0102,899 | MASK OPTIMIZATION PREFERENTIALLY ACCOUNTING FOR OVERLAP REGIONS | Aug 23, 24 | Mar 27, 25 | Not available |
| 2025/0093,765 | METHODS FOR MAKING SEMICONDUCTOR-BASED INTEGRATED CIRCUITS | Dec 05, 24 | Mar 20, 25 | Not available |
| 2025/0076,749 | OPC METHOD AND MASK MANUFACTURING METHOD INCLUDING OPC METHOD | Apr 25, 24 | Mar 06, 25 | Samsung Electronics Co. Ltd. |
| 2025/0068,051 | MASK OPTIMIZATION FOR FIRST LAYER THAT ACCOUNTS FOR OTHER LAYERS | Aug 23, 24 | Feb 27, 25 | Not available |
| 2025/0068,052 | MASK OPTIMIZATION FOR LAYER BASED ON COMPARISON OF COMPONENTS IN LAYER TO COMPONENTS IN OTHER LAYERS | Aug 23, 24 | Feb 27, 25 | Not available |
| 2025/0068,053 | MASK OPTIMIZATION ACCOUNTING FOR MORE CRITICAL AND LESS CRITICAL OVERLAP REGIONS | Aug 23, 24 | Feb 27, 25 | Not available |
| 2025/0044,678 | METHOD AND NON-TRANSITORY COMPUTER-READABLE MEDIUM FOR GENERATING LAYOUT BASED ON PATH LABELED WITH MARKER | Aug 04, 23 | Feb 06, 25 | Not available |
| 2025/0044,708 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES | Oct 18, 24 | Feb 06, 25 | Taiwan Semiconductor Manufacturing Company Ltd. |
| 2025/0048,712 | SEMICONDUCTOR DEVICE WITH DEEP TRENCH ISOLATION MASK LAYOUT | Oct 23, 24 | Feb 06, 25 | SK keyfoundry Inc. |
| 2025/0036,022 | OPTICAL PROXIMITY CORRECTION (OPC) METHOD AND MASK MANUFACTURING METHOD COMPRISING OPC METHOD | Apr 11, 24 | Jan 30, 25 | Not available |
| 2025/0028,235 | OPTICAL PROXIMITY CORRECTION METHODS AND MASK MANUFACTURING METHODS INCLUDING THE OPTICAL PROXIMITY CORRECTION METHODS | Apr 23, 24 | Jan 23, 25 | Not available |
| 2025/0020,993 | PHOTOMASK AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | Oct 01, 24 | Jan 16, 25 | Powerchip Semiconductor Manufacturing Corporation |
| 2025/0021,015 | DETERMINING AN ETCH EFFECT BASED ON AN ETCH BIAS DIRECTION | Oct 26, 22 | Jan 16, 25 | ASML NETHERLANDS B.V. |
| 2025/0004,361 | OPTICAL PROXIMITY CORRECTION METHOD AND SEMICONDUCTOR FABRICATION METHOD USING THE SAME | Feb 09, 24 | Jan 02, 25 | Not available |
| 2024/0427,229 | MANUFACTURING METHOD FOR PHOTOMASK, AND PHOTOMASK | Jun 05, 24 | Dec 26, 24 | Not available |
| 2024/0427,230 | METHOD OF FORMING PHOTOMASK, LAYOUT PATTERN AND SYSTEM FOR PATTERNING SEMICONDUCTOR SUBSTRATE BY USING PHOTOMASK | Oct 17, 23 | Dec 26, 24 | Fujian Jinhua Integrated Circuit Co., Ltd. |
| 2024/0427,231 | OPTICAL PROXIMITY CORRECTION METHOD AND MASK MANUFACTURING METHOD BY USING THE SAME | Jan 19, 24 | Dec 26, 24 | Samsung Electronics Co., Ltd. |
| 2024/0419,084 | OPTICAL PROXIMITY CORRECTION METHOD AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME | Feb 15, 24 | Dec 19, 24 | Not available |
| 2024/0413,024 | PATTERN INSPECTION DEVICE AND PATTERN INSPECTION METHOD | Dec 07, 23 | Dec 12, 24 | Samsung Electronics Co., Ltd. |
| 2024/0402,587 | METHOD FOR FABRICATING MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME | Mar 13, 24 | Dec 05, 24 | Not available |