G03F 1/34

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Patent/Pub #TitleFiling DateIssue/Publication DatePatent Owner
2024/0337,919 MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICEJun 30, 22Oct 10, 24501 Hoya Corporation
2022/0035,235 MASK BLANK, TRANSFER MASK, AND SEMICONDUCTOR-DEVICE MANUFACTURING METHODSep 10, 19Feb 03, 22501 Hoya Corporation
2013/0089,752 Forming a Bridging Feature Using Chromeless Phase-Shift LithographyOct 07, 11Apr 11, 13SEAGATE TECHNOLOGY LLC
2013/0089,753 Forming a Bridging Feature Using Chromeless Phase-Shift LithographyOct 07, 11Apr 11, 13SEAGATE TECHNOLOGY LLC
2013/0089,813 Forming a Bridging Feature Using Chromeless Phase-Shift LithographyOct 07, 11Apr 11, 13SEAGATE TECHNOLOGY LLC