G03F 1/30

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Patent/Pub #TitleFiling DateIssue/Publication DatePatent Owner
2024/0337,919 MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICEJun 30, 22Oct 10, 24501 Hoya Corporation
2024/0310,717 PHASE SHIFT MASK FOR EUV LITHOGRAPHY AND MANUFACTURING METHOD FOR THE PHASE SHIFT MASKMay 20, 24Sep 19, 24SK HYNIX INC.
2022/0397,818 PHASE SHIFT MASK FOR EUV LITHOGRAPHY AND MANUFACTURING METHOD FOR THE PHASE SHIFT MASKNov 17, 21Dec 15, 22SK HYNIX INC.
2019/0302,604 MASK BLANK, PHASE SHIFT MASK, METHOD OF MANUFACTURING PHASE SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICESep 04, 17Oct 03, 19501 Hoya Corporation
2018/0321,582 PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASKJul 12, 18Nov 08, 18Not available
2017/0192,348 PHASE SHIFT MASK AND METHOD OF FORMING PATTERNS USING THE SAMEMar 20, 17Jul 06, 17SAMSUNG DISPLAY CO., LTD.
2017/0068,155 MASK BLANK, METHOD OF MANUFACTURING PHASE SHIFT MASK, PHASE SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICEFeb 24, 15Mar 09, 17HOYA CORPORATION
2016/0124,299 TRANSMISSION BALANCING FOR PHASE SHIFT MASK WITH A TRIM MASKOct 30, 14May 05, 16SEAGATE TECHNOLOGY LLC
2015/0177,612 MASK AND METHOD FOR FORMING THE SAMEMar 03, 15Jun 25, 15TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
2013/0323,627 Photomasks, Methods Of Forming A Photomask, And Methods Of Photolithographically Patterning A SubstrateJun 04, 12Dec 05, 13MICRON TECHNOLOGY, INC.
2013/0280,644 MASK AND METHOD FOR FORMING THE SAMEApr 20, 12Oct 24, 13TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
2012/0228,743 Methods of Manufacturing Semiconductor Devices and Optical Proximity CorrectionMay 24, 12Sep 13, 12INFINEON TECHNOLOGIES AG