| 2025/0068,054 | Mask and Reticle Protection with Atomic Layer Deposition (ALD) | Nov 13, 24 | Feb 27, 25 | Not available |
| 2024/0427,228 | PHOTOMASK BLANK, PHOTOMASK, AND MANUFACTURING METHOD OF PHOTOMASK | Jun 12, 24 | Dec 26, 24 | Kioxia Corporation |
| 2024/0419,064 | PHASE SHIFT MASK AND METHOD FOR MANUFACTURING PHASE SHIFT MASK | Jan 30, 23 | Dec 19, 24 | Not available |
| 2024/0377,722 | MASK AND METHOD OF FORMING THE SAME | Jul 22, 24 | Nov 14, 24 | Taiwan Semiconductor Manufacturing Company Ltd. |
| 2024/0345,467 | BLANK MASK AND METHOD OF FABRICATING THE SAME | Apr 17, 24 | Oct 17, 24 | Not available |
| 2024/0302,732 | PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING PHASE SHIFT MASK | Mar 15, 22 | Sep 12, 24 | Not available |
| 2024/0295,807 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD OF MANUFACTURING REFLECTIVE MASK | Apr 29, 24 | Sep 05, 24 | AGC Inc. |
| 2024/0168,370 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD OF MANUFACTURING REFLECTIVE MASK | Oct 20, 23 | May 23, 24 | AGC Inc. |
| 2024/0126,162 | PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY | Nov 17, 22 | Apr 18, 24 | S&S TECH CO., LTD. |
| 2024/0126,163 | PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY | Jan 24, 23 | Apr 18, 24 | S&S TECH CO., LTD. |
| 2024/0103,354 | REFLECTIVE MASK BLANK AND REFLECTIVE MASK | Dec 01, 23 | Mar 28, 24 | 501 Hoya Corporation |
| 2024/0103,355 | REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE | Dec 04, 23 | Mar 28, 24 | 501 Hoya Corporation |
| 2024/0094,622 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD OF MANUFACTURING REFLECTIVE MASK | Nov 22, 23 | Mar 21, 24 | AGC Inc. |
| 2024/0012,322 | PHOTOMASK STRUCTURE | Jul 31, 22 | Jan 11, 24 | United Microelectronics Corp. |
| 2023/0367,199 | Reflective Photomask Blank, and Method for Manufacturing Reflective Photomask | Apr 27, 23 | Nov 16, 23 | Shin-Etsu Chemical Co., Ltd. |
| 2023/0333,461 | PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING PHASE SHIFT MASK | Sep 07, 21 | Oct 19, 23 | Not available |
| 2023/0259,014 | MASK AND METHOD OF FORMING THE SAME | Apr 27, 23 | Aug 17, 23 | Taiwan Semiconductor Manufacturing Company Ltd. |
| 2023/0236,494 | REFLECTIVE HOLOGRAPHIC PHASE MASKS | Jan 25, 23 | Jul 27, 23 | Not available |
| 2023/0168,574 | LAMINATE FOR BLANK MASK AND MANUFACTURING METHOD FOR THE SAME | Nov 28, 22 | Jun 01, 23 | SKC solmics Co., Ltd. |
| 2023/0099,176 | MASK BLANK, TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | Dec 02, 22 | Mar 30, 23 | 501 Hoya Corporation |