| 2025/0102,903 | EUV MASK AND PELLICLE ASSEMBLY | Sep 27, 23 | Mar 27, 25 | Not available |
| 2025/0102,919 | DIFFERENTIAL EVACUATION DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD | Aug 16, 24 | Mar 27, 25 | Gigaphoton Inc. |
| 2025/0093,764 | EXTREME ULTRAVIOLET MASK | Nov 27, 24 | Mar 20, 25 | Taiwan Semiconductor Manufacturing Company Ltd. |
| 2025/0076,752 | PELLICLE FOR EUV LITHOGRAPHY MASK | Nov 15, 24 | Mar 06, 25 | Taiwan Semiconductor Manufacturing Company Ltd. |
| 2025/0044,680 | MASK INSPECTION DEVICE FOR PHOTOMASKS OF EUV LITHOGRAPHY AND CARRIER ELEMENT FOR USE IN A MASK INSPECTION DEVICE | Jul 17, 24 | Feb 06, 25 | Not available |
| 2025/0044,708 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES | Oct 18, 24 | Feb 06, 25 | Taiwan Semiconductor Manufacturing Company Ltd. |
| 2025/0028,234 | PELLICLE FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND METHOD FOR MANUFACTURING SAME | Nov 25, 22 | Jan 23, 25 | INFOVION INC. |
| 2025/0004,387 | CONTROLLING ELECTROSTATIC CHARGE ON MASKS FOR EXTREME ULTRAVIOLET LITHOGRAPHY | Jun 28, 23 | Jan 02, 25 | Not available |
| 2024/0419,062 | ULTRA-THIN, ULTRA-LOW DENSITY FILMS FOR EUV LITHOGRAPHY | Aug 27, 24 | Dec 19, 24 | LINTEC OF AMERICA, INC. |
| 2024/0402,613 | METHOD FOR SIMULATING ILLUMINATION AND IMAGING PROPERTIES OF AN OPTICAL PRODUCTION SYSTEM WHEN ILLUMINATING AND IMAGING AN OBJECT BY MEANS OF AN OPTICAL MEASUREMENT SYSTEM | May 31, 24 | Dec 05, 24 | Not available |
| 2024/0393,673 | METHOD OF FAST SURFACE PARTICLE AND SCRATCH DETECTION FOR EUV MASK BACKSIDE | Jul 31, 24 | Nov 28, 24 | Taiwan Semiconductor Manufacturing Company Ltd. |
| 2024/0393,677 | METHOD FOR FORMING SEMICONDUCTOR DEVICE | Jul 31, 24 | Nov 28, 24 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 2024/0393,699 | MASK BLANK SUBSTRATE AND MANUFACTURING METHOD THEREOF | May 23, 24 | Nov 28, 24 | Shin-Etsu Chemical Co., Ltd. |
| 2024/0385,505 | DRY PHOTORESIST OR HARDMASK FOR EUV LITHOGRAPHY | May 18, 23 | Nov 21, 24 | Not available |
| 2024/0385,511 | RETICLE ENCLOSURE FOR LITHOGRAPHY SYSTEMS | Jul 29, 24 | Nov 21, 24 | Taiwan Semiconductor Manufacturing Company Ltd. |
| 2024/0377,722 | MASK AND METHOD OF FORMING THE SAME | Jul 22, 24 | Nov 14, 24 | Taiwan Semiconductor Manufacturing Company Ltd. |
| 2024/0377,741 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | Apr 30, 24 | Nov 14, 24 | Shin-Etsu Chemical Co., Ltd. |
| 2024/0369,918 | METHOD OF MANUFACTURING EUV PHOTO MASKS | Jul 12, 24 | Nov 07, 24 | Taiwan Semiconductor Manufacturing Company Ltd. |
| 2024/0369,919 | PATTERNING DEVICE FOR A LITHOGRAPHIC APPARATUS AND METHOD | Mar 09, 22 | Nov 07, 24 | ASML Netherlands B.V. |
| 2024/0369,921 | RETICLE ENCLOSURE FOR LITHOGRAPHY SYSTEMS | Jul 18, 24 | Nov 07, 24 | Taiwan Semiconductor Manufacturing Company Ltd. |