G03F 1/20

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Patent/Pub #TitleFiling DateIssue/Publication DatePatent Owner
2024/0377,741 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESSApr 30, 24Nov 14, 24Shin-Etsu Chemical Co., Ltd.
2024/0036,456 METHOD FOR ELECTRON BEAM-INDUCED PROCESSING OF A DEFECT OF A MICROLITHOGRAPHIC PHOTOMASKJul 27, 23Feb 01, 24Not available
2024/0027,889 METAL OXIDE FILM-FORMING COMPOSITION, METHOD FOR PRODUCING METAL OXIDE FILMS USING SAME, AND METHOD FOR REDUCING VOLUME SHRINKAGE RATIO OF METAL OXIDE FILMSNov 30, 21Jan 25, 24Not available
2024/0004,282 Structured Film and Method of Using Same to Form a Pattern on a SubstrateDec 15, 21Jan 04, 24Not available
2022/0299,861 MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD OF ADJUSTING SAMEMar 07, 22Sep 22, 22NuFlare Technology, Inc.
2021/0173,295 RETICLE PROCESSING SYSTEMDec 03, 20Jun 10, 21Applied Materials Inc.
2021/0132,486 USING MASK FABRICATION MODELS IN CORRECTION OF LITHOGRAPHIC MASKSNov 04, 20May 06, 21Not available
2020/0227,235 Charged Particle Beam Lithography SystemJan 15, 20Jul 16, 20Not available
2019/0391,480 Mask Patterns and Method of ManufactureJun 26, 18Dec 26, 19Not available
2019/0204,727 PHOTORESIST AND PREPARATION METHOD THEREOFMay 31, 18Jul 04, 19Not available
2018/0267,399 METHOD OF APPLYING VERTEX BASED CORRECTIONS TO A SEMICONDUCTOR DESIGNDec 22, 15Sep 20, 18Not available
2018/0252,995 MASK BLANK, PHASE SHIFT MASK AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICESep 08, 16Sep 06, 18501 Hoya Corporation
2018/0143,526 EBEAM THREE BEAM APERTURE ARRAYJan 17, 18May 24, 18Not available
2018/0144,936 Assistant Pattern for Measuring Critical Dimension of Main Pattern In Semiconductor ManufacturingNov 18, 16May 24, 18Not available
2018/0074,394 DIVISION MASKSep 11, 17Mar 15, 18SAMSUNG DISPLAY CO., LTD.
2017/0361,551 SYSTEMS AND METHODS FOR RAPIDLY FABRICATING NANOPATTERNS IN A PARALLEL FASHION OVER LARGE AREASDec 08, 15Dec 21, 17Not available
2017/0355,795 POLYMER, NEGATIVE RESIST COMPOSITION, AND PATTERN FORMING PROCESSMay 16, 17Dec 14, 17SHIN-ETSU CHEMICAL CO., LTD.
2017/0322,485 Method and System for Forming a Pattern on a Reticle Using Charged Particle Beam LithographyJul 20, 17Nov 09, 17D2S, Inc.
2017/0299,544 2H/1T Phase Contact Engineering for High Performance Transition Metal Dichalcogenide Chemical Vapor SensorsApr 04, 17Oct 19, 17The United States of America as represented by the Secretary of the Navy
2017/0285,457 LASER ABLATION TOOLING VIA SPARSE PATTERNED MASKSJun 21, 17Oct 05, 17Not available

Showing 1 to 20 of 37 results