2024/0377,741 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | Apr 30, 24 | Nov 14, 24 | Shin-Etsu Chemical Co., Ltd. |
2024/0036,456 | METHOD FOR ELECTRON BEAM-INDUCED PROCESSING OF A DEFECT OF A MICROLITHOGRAPHIC PHOTOMASK | Jul 27, 23 | Feb 01, 24 | Not available |
2024/0027,889 | METAL OXIDE FILM-FORMING COMPOSITION, METHOD FOR PRODUCING METAL OXIDE FILMS USING SAME, AND METHOD FOR REDUCING VOLUME SHRINKAGE RATIO OF METAL OXIDE FILMS | Nov 30, 21 | Jan 25, 24 | Not available |
2024/0004,282 | Structured Film and Method of Using Same to Form a Pattern on a Substrate | Dec 15, 21 | Jan 04, 24 | Not available |
2022/0299,861 | MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD OF ADJUSTING SAME | Mar 07, 22 | Sep 22, 22 | NuFlare Technology, Inc. |
2021/0173,295 | RETICLE PROCESSING SYSTEM | Dec 03, 20 | Jun 10, 21 | Applied Materials Inc. |
2021/0132,486 | USING MASK FABRICATION MODELS IN CORRECTION OF LITHOGRAPHIC MASKS | Nov 04, 20 | May 06, 21 | Not available |
2020/0227,235 | Charged Particle Beam Lithography System | Jan 15, 20 | Jul 16, 20 | Not available |
2019/0391,480 | Mask Patterns and Method of Manufacture | Jun 26, 18 | Dec 26, 19 | Not available |
2019/0204,727 | PHOTORESIST AND PREPARATION METHOD THEREOF | May 31, 18 | Jul 04, 19 | Not available |
2018/0267,399 | METHOD OF APPLYING VERTEX BASED CORRECTIONS TO A SEMICONDUCTOR DESIGN | Dec 22, 15 | Sep 20, 18 | Not available |
2018/0252,995 | MASK BLANK, PHASE SHIFT MASK AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | Sep 08, 16 | Sep 06, 18 | 501 Hoya Corporation |
2018/0143,526 | EBEAM THREE BEAM APERTURE ARRAY | Jan 17, 18 | May 24, 18 | Not available |
2018/0144,936 | Assistant Pattern for Measuring Critical Dimension of Main Pattern In Semiconductor Manufacturing | Nov 18, 16 | May 24, 18 | Not available |
2018/0074,394 | DIVISION MASK | Sep 11, 17 | Mar 15, 18 | SAMSUNG DISPLAY CO., LTD. |
2017/0361,551 | SYSTEMS AND METHODS FOR RAPIDLY FABRICATING NANOPATTERNS IN A PARALLEL FASHION OVER LARGE AREAS | Dec 08, 15 | Dec 21, 17 | Not available |
2017/0355,795 | POLYMER, NEGATIVE RESIST COMPOSITION, AND PATTERN FORMING PROCESS | May 16, 17 | Dec 14, 17 | SHIN-ETSU CHEMICAL CO., LTD. |
2017/0322,485 | Method and System for Forming a Pattern on a Reticle Using Charged Particle Beam Lithography | Jul 20, 17 | Nov 09, 17 | D2S, Inc. |
2017/0299,544 | 2H/1T Phase Contact Engineering for High Performance Transition Metal Dichalcogenide Chemical Vapor Sensors | Apr 04, 17 | Oct 19, 17 | The United States of America as represented by the Secretary of the Navy |
2017/0285,457 | LASER ABLATION TOOLING VIA SPARSE PATTERNED MASKS | Jun 21, 17 | Oct 05, 17 | Not available |