| 2017/0372,816 | CONDUCTIVE FILM, METHOD OF PRODUCING THE SAME, AND TOUCH PANEL | Sep 04, 17 | Dec 28, 17 | FUJIFILM CORPORATION |
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| 2010/0099,043 | Positive Photosensitive Resin Composition | Oct 20, 09 | Apr 22, 10 | CHEIL INDUSTRIES INC. |
| 2010/0062,368 | LOW OUTGASSING PHOTORESIST COMPOSITIONS | Sep 08, 08 | Mar 11, 10 | GLOBALFOUNDRIES INC. |
| 2010/0047,724 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | Aug 03, 09 | Feb 25, 10 | TOKYO OHKA KOGYO CO., LTD. |
| 2009/0186,300 | RESIST COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, METHOD OF FORMING RESIST PATTERN, AND FLUORINE-CONTAINING COPOLYMER | Jan 05, 09 | Jul 23, 09 | TOKYO OHKA KOGYO CO., LTD. |
| 2009/0087,786 | PATTERNING PROCESS AND RESIST COMPOSITION USED THEREIN | Sep 04, 08 | Apr 02, 09 | SHIN-ETSU CHEMICAL CO., LTD. |
| 2009/0061,356 | POLYMER COMPOUND, POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | Aug 26, 08 | Mar 05, 09 | TOKYO OHKA KOGYO CO., LTD. |
| 2009/0011,366 | PATTERN FORMING METHOD, RESIST COMPOSITION TO BE USED IN THE PATTERN FORMING METHOD, NEGATIVE DEVELOPING SOLUTION TO BE USED IN THE PATTERN FORMING METHOD AND RINSING SOLUTION FOR NEGATIVE DEVELOPMENT TO BE USED IN THE PATTERN FORMING METHOD | Jun 24, 08 | Jan 08, 09 | FUJIFILM CORPORATION |
| 2009/0004,598 | Resist Composition And Method For Forming Resist Pattern | Aug 19, 05 | Jan 01, 09 | TOKYO OHKA KOGYO CO., LTD. |
| 2009/0004,600 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | Jun 20, 08 | Jan 01, 09 | SUMITOMO CHEMICAL COMPANY, LIMITED |
| 2008/0311,520 | ON-PRESS DEVELOPABLE NEGATIVE-WORKING IMAGEABLE ELEMENTS AND METHODS OF USE | Jun 13, 07 | Dec 18, 08 | EASTMAN KODAK COMPANY |
| 2008/0305,433 | POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH THE SAME | Aug 18, 08 | Dec 11, 08 | FUJIFILM CORPORATION |
| 2008/0286,686 | FLUORINATED HALF ESTER OF MALEIC ANHYDRIDE POLYMERS FOR DRY 193 NM TOP ANTIREFLECTIVE COATING APPLICATION | Jul 21, 08 | Nov 20, 08 | GLOBALFOUNDRIES INC. |
| 2008/0145,786 | Photosensitive Resin Composition for Forming Organic Insulating Film and Device Using the Same | Oct 26, 07 | Jun 19, 08 | CHEIL INDUSTRIES INC. |
| 2008/0026,334 | Topcoat layers for phosphor or scintillator screens or panels | Jun 13, 07 | Jan 31, 08 | AGFA HEALTHCARE NV |
| 2003/0228,547 | Silver halide photographic light-sensitive material | Mar 21, 03 | Dec 11, 03 | FUJIFILM CORPORATION |