| 9806282 | Organic light-emitting diode and manufacturing method therefor | May 30, 14 | Oct 31, 17 | LG DISPLAY CO., LTD. |
| 9750120 | Coaxial microwave applicator for plasma production | Jul 10, 13 | Aug 29, 17 | UNIVERSITE JOSEPH FOURIER, Universite Joseph Fourier—Grenoble 1, |
| 9125288 | Ion-mode plasma containment | Nov 08, 11 | Sep 01, 15 | UTAH STATE UNIVERSITY RESEARCH FOUNDATION |
| 8425852 | using the generating system | Mar 03, 10 | Apr 23, 13 | NOXILIZER, INC. |
| 7869556 | Method and device for the operation of a plasma device | Dec 09, 05 | Jan 11, 11 | MAX-PLANCK-GESELLSCHAFT ZUR FOERDERUNG DER WISSENSCHAFTEN E.V. |
| 7625494 | Plasma etching method and plasma etching unit | Jun 04, 04 | Dec 01, 09 | TOKYO ELECTRON LIMITED, KABUSHIKI KAISHA TOSHIBA, |
| 6677001 | Microwave enhanced CVD method and apparatus | Jun 06, 95 | Jan 13, 04 | Semiconductor Energy Laboratory Co., Ltd. |
| 6346303 | Process for synthesizing one-dimensional nanosubstances by electron cyclotron resonance chemical vapor deposition | May 14, 99 | Feb 12, 02 | NATIONAL SCIENCE COUNCIL |
| 5962083 | Methods of depositing films on polymer substrates | Jun 13, 96 | Oct 05, 99 | SUZUKI MOTOR CORPORATION |
| 5948485 | Plasma deposition method and an apparatus therefor | Apr 02, 96 | Sep 07, 99 | TOKYO ELECTRON LIMITED |
| 5444207 | Plasma generating device and surface processing device and method for processing wafers in a uniform magnetic field | Mar 26, 93 | Aug 22, 95 | KABUSHIKI KAISHA TOSHIBA |
| 5335238 | Apparatus and method for guiding an electric discharge with a magnetic field | Apr 08, 93 | Aug 02, 94 | JOHNT.BAHNS TRUST, UNIVERSITY OF IOWA RESEARCH FOUNDATION, |
| 5243259 | Microwave plasma processing apparatus | Nov 27, 91 | Sep 07, 93 | HITACHI, LTD., Hitachi Engineering Services Co., Ltd., |
| 5225740 | Method and apparatus for producing high density plasma using whistler mode excitation | Mar 26, 92 | Jul 06, 93 | GENERAL ATOMICS |
| 5216329 | Device for distributing a microwave energy for exciting a plasma | Jan 22, 92 | Jun 01, 93 | Metal Process (Societe a Responsabilite Limitee) |
| 5198725 | Method of producing flat ECR layer in microwave plasma device and apparatus therefor | Jul 12, 91 | Mar 30, 93 | LAM RESEARCH CORPORATION |
| 5189446 | Plasma wafer processing tool having closed electron cyclotron resonance | May 17, 91 | Feb 23, 93 | INTERNATIONAL BUSINESS MACHINES CORPORATION |
| 5182495 | Plasma processing method and apparatus using electron cyclotron resonance | Nov 29, 90 | Jan 26, 93 | HITACHI, LTD. |
| 5173641 | Plasma generating apparatus | Sep 12, 91 | Dec 22, 92 | TOKYO ELECTRON LIMITED |
| 5169407 | Method of determining end of cleaning of semiconductor manufacturing apparatus | Dec 07, 90 | Dec 08, 92 | KABUSHIKI KAISHA TOSHIBA |