H05H 1/16

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Patent/Pub #TitleFiling DateIssue/Publication DatePatent Owner
9875816 Systems and methods for compressing plasmaJul 01, 16Jan 23, 18GENERAL FUSION INC.
9672943 Apparatus for magnetic and electrostatic confinement of plasmaJun 02, 16Jun 06, 17THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
9596745 Apparatus for accelerating and compressing plasmaAug 29, 13Mar 14, 17GENERAL FUSION INC.
9462669 Plasma confinement deviceOct 09, 15Oct 04, 16Not available
9424955 Systems and methods for compressing plasmaJul 03, 13Aug 23, 16GENERAL FUSION INC.
9386676 Apparatus for magnetic and electrostatic confinement of plasmaJun 11, 13Jul 05, 16THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
9380692 Apparatus and arrangements of magnetic field generators to facilitate physical vapor deposition to form semiconductor filmsMar 15, 13Jun 28, 16SAMSUNG ELECTRONICS CO., LTD., SEMICAT, INC.,
9370086 Formation of a field reversed configuration for magnetic and electrostatic confinement of plasmaNov 02, 09Jun 14, 16THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
9370087 Plasma gateNov 15, 12Jun 14, 16Not available
9265137 Formation of a field reversed configuration for magnetic and electrostatic confinement of plasmaMay 13, 09Feb 16, 16THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
8592712 Mounting table structure and plasma film forming apparatusMar 17, 10Nov 26, 13TOKYO ELECTRON LIMITED
8175209 Method and apparatus for pulsed power generationDec 14, 09May 08, 12Not available
7634042 Pulsed power system including a plasma opening switchMar 23, 05Dec 15, 09Not available
RE40963 Method for plasma processing by shaping an induced electric fieldJul 24, 03Nov 10, 09TOKYO ELECTRON LIMITED
7544397 Recording media having protective overcoats of highly tetrahedral amorphous carbon and methods for their productionFeb 06, 04Jun 09, 09DIAMONDOP, LLC, Stormedia Texas, LLC,
7303790 Electron cyclotron resonance plasma deposition process and device for single-wall carbon nanotubes and nanotubes thus obtainedOct 26, 01Dec 04, 07COMMISSARIAT A L'ENERGIE ATOMIQUE
6514347 Apparatus and method for plasma treatmentFeb 14, 01Feb 04, 03TOKYO ELECTRON LIMITED
6392350 Plasma processing methodSep 06, 00May 21, 02TOKYO ELECTRON LIMITED
6265031 Method for plasma processing by shaping an induced electric fieldFeb 18, 99Jul 24, 01TOKYO ELECTRON LIMITED
5928528 Plasma treatment method and plasma treatment systemSep 02, 97Jul 27, 99MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.

Showing 1 to 20 of 28 results