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| RE50001 | Method and system for cross-sectioning a sample with a preset thickness or to a target site | Sep 02, 21 | Jun 04, 24 | FIBICS INCORPORATED |
| RE49952 | Beam grid layout | Apr 02, 20 | Apr 30, 24 | ASML Netherlands B.V. |
| RE49784 | Apparatus of plural charged-particle beams | Aug 27, 20 | Jan 02, 24 | ASML Netherlands B.V. |
| RE49732 | Charged particle lithography system with alignment sensor and beam measurement sensor | May 30, 19 | Nov 21, 23 | ASML Netherlands B.V. |
| RE49602 | Lithography system, sensor and measuring method | Sep 02, 20 | Aug 08, 23 | ASML Netherlands B.V. |
| RE49483 | Method for determining a beamlet position and method for determining a distance between two beamlets in a multi-beamlet exposure apparatus | May 16, 19 | Apr 04, 23 | ASML Netherlands B.V. |
| RE49241 | Lithography system and method for processing a target, such as a wafer | Sep 11, 19 | Oct 11, 22 | ASML Netherlands B.V. |
| RE49118 | Material for organic electroluminescence device and electroluminescence device employing the same | Feb 28, 20 | Jun 28, 22 | Idemitsu Kosan Co. Ltd. |
| RE48287 | Method for forming an optical fiber array | Oct 03, 18 | Oct 27, 20 | ASML Netherlands B.V. |
| RE48201 | Specimen holder used for mounting samples in electron microscopes | Oct 12, 16 | Sep 08, 20 | PROTOCHIPS, INC. |
| RE48046 | Lithography system, sensor and measuring method | Aug 26, 14 | Jun 09, 20 | ASML NETHERLANDS B.V. |
| RE48002 | High resolution display panel with emissive organic layers emitting light of different colors | Oct 21, 16 | May 19, 20 | IGNIS INNOVATION INC. |
| RE47922 | Charged particle beam writing apparatus and charged particle beam writing method | Jul 14, 16 | Mar 31, 20 | NuFlare Technology, Inc. |
| RE47767 | Group III-nitride layers with patterned surfaces | Dec 23, 15 | Dec 17, 19 | Nokia of America Corporation |
| RE47707 | Charged particle beam writing apparatus and charged particle beam writing method | Oct 10, 16 | Nov 05, 19 | NuFlare Technology, Inc. |
| RE47561 | Multi charged particle beam writing method and multi charged particle beam writing apparatus | May 09, 16 | Aug 06, 19 | NuFlare Technology, Inc. |
| RE47287 | Lithography system, sensor, converter element and method of manufacture | Jan 22, 15 | Mar 12, 19 | Mapper Lithography IP B.V. |
| RE47275 | Substrate support providing gap height and planarization adjustment in plasma processing chamber | Oct 15, 15 | Mar 05, 19 | Lam Research Corporation |
| RE47073 | Spark plug | Feb 10, 14 | Oct 02, 18 | Vomar Tech, Inc. |