G21K 1/06

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Patent/Pub #TitleFiling DateIssue/Publication DatePatent Owner
9997268 EUV-mirror, optical system with EUV-mirror and associated operating methodSep 12, 16Jun 12, 18Carl Zeiss SMT GmbH
9996005 Reflective optical element and optical system for EUV lithographyNov 18, 13Jun 12, 18Carl Zeiss SMT GmbH
9989844 Pellicle for reticle and multilayer mirrorSep 29, 16Jun 05, 18ASML NETHERLANDS B.V.
9992856 Solution for EUV power increment at wafer levelAug 30, 16Jun 05, 18Taiwan Semiconductor Manufacturing Co Ltd.
9986628 Method and apparatus for generating radiationOct 10, 13May 29, 18ASML Netherlands B.V.
9983482 Radiation collector, radiation source and lithographic apparatusFeb 26, 14May 29, 18ASML Netherlands B.V.; Carl Zeiss SMT GmbH;
9971161 Device for electromagnetic wave cloakingMar 10, 13May 15, 18Hangzhou Zhejiang University Sensing Instruments Co., Ltd.
9971121 Device for spatially orienting an X-ray optical unit and apparatus having such a deviceFeb 13, 14May 15, 18BRUKER NANO GMBH
9970119 Curved grating structure manufacturing method, curved grating structure, grating unit, and x-ray imaging deviceOct 02, 14May 15, 18KONICA MINOLTA , INC.
9966161 Mechanical design of thin-film diamond crystal mounting apparatus with optimized thermal contact and crystal strain for coherence preservation x-ray opticsSep 21, 15May 08, 18UChicago Argonne, LLC
9953734 Microstructure manufacturing methodJan 27, 16Apr 24, 18CANON KABUSHIKI KAISHA
9953735 X-ray reflective lens arrangementSep 01, 13Apr 24, 18CONVERGENT R.N.R LTD
9955563 EUV light source for generating a usable output beam for a projection exposure apparatusMar 03, 15Apr 24, 18Carl Zeiss SMT GmbH
9942973 Extreme ultraviolet light generation apparatusApr 06, 17Apr 10, 18Gigaphoton Inc.
9939731 Illumination optics for EUV projection lithographyAug 09, 17Apr 10, 18Carl Zeiss SMT GmbH
9938026 Energy beam propulsion systemJul 17, 17Apr 10, 18Not available
9921483 Surface correction of mirrors with decoupling coatingDec 28, 15Mar 20, 18CARL ZEISS SMT GMBH
9915873 Reflective optical element, and optical system of a microlithographic projection exposure apparatusMay 20, 16Mar 13, 18CARL ZEISS SMT GMBH
9915876 EUV mirror and optical system comprising EUV mirrorJul 10, 15Mar 13, 18CARL ZEISS SMT GMBH
9910193 Reflective optical element and EUV lithography applianceOct 31, 14Mar 06, 18CARL ZEISS SMT AG, CARL ZEISS SMT GMBH,

Showing 1 to 20 of 483 results