9997268 | EUV-mirror, optical system with EUV-mirror and associated operating method | Sep 12, 16 | Jun 12, 18 | Carl Zeiss SMT GmbH |
9996005 | Reflective optical element and optical system for EUV lithography | Nov 18, 13 | Jun 12, 18 | Carl Zeiss SMT GmbH |
9989844 | Pellicle for reticle and multilayer mirror | Sep 29, 16 | Jun 05, 18 | ASML NETHERLANDS B.V. |
9992856 | Solution for EUV power increment at wafer level | Aug 30, 16 | Jun 05, 18 | Taiwan Semiconductor Manufacturing Co Ltd. |
9986628 | Method and apparatus for generating radiation | Oct 10, 13 | May 29, 18 | ASML Netherlands B.V. |
9983482 | Radiation collector, radiation source and lithographic apparatus | Feb 26, 14 | May 29, 18 | ASML Netherlands B.V.; Carl Zeiss SMT GmbH; |
9971161 | Device for electromagnetic wave cloaking | Mar 10, 13 | May 15, 18 | Hangzhou Zhejiang University Sensing Instruments Co., Ltd. |
9971121 | Device for spatially orienting an X-ray optical unit and apparatus having such a device | Feb 13, 14 | May 15, 18 | BRUKER NANO GMBH |
9970119 | Curved grating structure manufacturing method, curved grating structure, grating unit, and x-ray imaging device | Oct 02, 14 | May 15, 18 | KONICA MINOLTA , INC. |
9966161 | Mechanical design of thin-film diamond crystal mounting apparatus with optimized thermal contact and crystal strain for coherence preservation x-ray optics | Sep 21, 15 | May 08, 18 | UChicago Argonne, LLC |
9953734 | Microstructure manufacturing method | Jan 27, 16 | Apr 24, 18 | CANON KABUSHIKI KAISHA |
9953735 | X-ray reflective lens arrangement | Sep 01, 13 | Apr 24, 18 | CONVERGENT R.N.R LTD |
9955563 | EUV light source for generating a usable output beam for a projection exposure apparatus | Mar 03, 15 | Apr 24, 18 | Carl Zeiss SMT GmbH |
9942973 | Extreme ultraviolet light generation apparatus | Apr 06, 17 | Apr 10, 18 | Gigaphoton Inc. |
9939731 | Illumination optics for EUV projection lithography | Aug 09, 17 | Apr 10, 18 | Carl Zeiss SMT GmbH |
9938026 | Energy beam propulsion system | Jul 17, 17 | Apr 10, 18 | Not available |
9921483 | Surface correction of mirrors with decoupling coating | Dec 28, 15 | Mar 20, 18 | CARL ZEISS SMT GMBH |
9915873 | Reflective optical element, and optical system of a microlithographic projection exposure apparatus | May 20, 16 | Mar 13, 18 | CARL ZEISS SMT GMBH |
9915876 | EUV mirror and optical system comprising EUV mirror | Jul 10, 15 | Mar 13, 18 | CARL ZEISS SMT GMBH |
9910193 | Reflective optical element and EUV lithography appliance | Oct 31, 14 | Mar 06, 18 | CARL ZEISS SMT AG, CARL ZEISS SMT GMBH, |