G03F 1/54

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Patent/Pub #TitleFiling DateIssue/Publication DatePatent Owner
9996013 Extreme ultraviolet lithography process and maskJun 27, 16Jun 12, 18Taiwan Semiconductor Manufacturing Company, Ltd.
9972781 Method of manufacturing mask and method of manufacturing display deviceMar 29, 16May 15, 18SAMSUNG DISPLAY CO., LTD.
9971238 Mask blank, phase shift mask, and production method thereofJan 29, 15May 15, 18Dai Nippon Printing Co., Ltd.
9964847 Mask substrate structureJun 20, 16May 08, 18Globalfoundries Inc.
9952498 Mask blank, and transfer maskSep 21, 16Apr 24, 18501 Hoya Corporation
9952497 Mask blank and method of manufacturing phase shift maskOct 06, 16Apr 24, 18HOYA CORPORATION
9939725 Method and device for producing masks for a laser installationNov 22, 10Apr 10, 18Boegli - Gravures SA
9891518 MaskNov 19, 14Feb 13, 18BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD., BOE TECHNOLOGY GROUP CO., LTD.,
9885950 Phase shift mask, method for manufacturing the same, and method for forming micro patternApr 20, 15Feb 06, 18SAMSUNG DISPLAY CO., LTD.
9851633 Inorganic material film, photomask blank, and method for manufacturing photomaskJun 23, 16Dec 26, 17SHIN-ETSU CHEMICAL CO., LTD.
9798053 Mask plate, color filter substrate and method for fabricating the same, display panel and display deviceMar 29, 16Oct 24, 17BOE TECHNOLOGY GROUP CO., LTD., HEFEI BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.,
9798230 Photomask blankSep 11, 15Oct 24, 17SHIN-ETSU CHEMICAL CO., LTD.
9766537 MaskApr 14, 15Sep 19, 17BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD., BOE TECHNOLOGY GROUP CO., LTD.,
9766540 Method of forming photomaskDec 22, 15Sep 19, 17SAMSUNG ELECTRONICS CO., LTD.
9766546 Method of producing a resist structure with undercut sidewallJul 25, 14Sep 19, 17AMS AG
9754794 Plasmonic nano-lithography based on attenuated total reflectionSep 03, 12Sep 05, 17EMPIRE TECHNOLOGY DEVELOPMENT LLC
9709884 EUV mask and manufacturing method by using the sameJun 11, 15Jul 18, 17TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
9689066 Photomask blank manufacturing method, photomask blank, photomask, and pattern transfer methodMay 13, 13Jun 27, 17SHIN-ETSU CHEMICAL CO., LTD.
9664996 Photomasks for reducing thermal stress generated by heatJun 17, 15May 30, 17SK HYNIX INC.
9651858 Binary photomask blank, preparation thereof, and preparation of binary photomaskJul 14, 15May 16, 17SHIN-ETSU CHEMICAL CO., LTD.

Showing 1 to 20 of 70 results