G03F 1/52

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Patent/Pub #TitleFiling DateIssue/Publication DatePatent Owner
9798050 Substrate with multilayer reflective film, mask blank, transfer mask and method of manufacturing semiconductor deviceSep 25, 14Oct 24, 17HOYA CORPORATION
9733562 Extreme ultraviolet lithography process and maskOct 26, 15Aug 15, 17TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
9696619 Technique for repairing a reflective photo-maskMar 11, 15Jul 04, 17DINO TECHNOLOGY ACQUISITION LLC
9599888 Reflective lithography masks and systems and methodsFeb 03, 16Mar 21, 17TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
9586850 Method for producing titanium-doped silica glass for use in EUV lithography and blank produced in accordance therewithJul 22, 14Mar 07, 17HERAEUS QUARZGLAS GMBH & CO. KG
9588419 Extreme ultraviolet light (EUV) photomasks and fabrication methods thereofJul 27, 15Mar 07, 17TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
9583709 Mask for forming organic layer pattern, forming method of organic layer pattern, and manufacturing method of organic light emitting diode display using the sameNov 04, 14Feb 28, 17SAMSUNG DISPLAY CO., LTD.
9557636 Extreme ultraviolet lithography mask and multilayer deposition method for fabricating sameSep 08, 14Jan 31, 17TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
9507254 Method of manufacturing substrate with a multilayer reflective film, method of manufacturing a reflective mask blank, substrate with a multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing a semiconductor deviceSep 24, 13Nov 29, 16HOYA CORPORATION
9470872 Reflective optical elementOct 30, 14Oct 18, 16CARL ZEISS SMT GMBH
9454073 Photomask blank and photomask for suppressing heat absorptionNov 21, 14Sep 27, 16SK HYNIX INC.
9341938 Mask plate, exposure system and exposing methodDec 12, 13May 17, 16BOE TECHNOLOGY GROUP CO., LTD., CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.,
9341941 Reflective photomask blank, reflective photomask, and integrated circuit device manufactured by using reflective photomaskJul 21, 14May 17, 16SAMSUNG ELECTRONICS CO., LTD.
9261792 Reflective lithography masks and systems and methodsJul 25, 14Feb 16, 16TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
9195143 Mask plate and exposing methodJul 03, 13Nov 24, 15BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
9140979 MaskJan 23, 12Sep 22, 15LG CHEM, LTD.
9134604 Extreme ultraviolet (EUV) mask and method of fabricating the EUV maskAug 30, 13Sep 15, 15TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
9034665 Tool configuration and method for extreme ultra-violet (EUV) patterning with a deformable reflective surfaceOct 11, 13May 19, 15TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
8940463 Method and apparatus for EUV mask having diffusion barrierMar 14, 13Jan 27, 15INTERMOLECULAR, INC.
8936889 Method and apparatus for EUV mask having diffusion barrierMar 14, 13Jan 20, 15INTERMOLECULAR, INC.

Showing 1 to 20 of 24 results