9798050 | Substrate with multilayer reflective film, mask blank, transfer mask and method of manufacturing semiconductor device | Sep 25, 14 | Oct 24, 17 | HOYA CORPORATION |
9733562 | Extreme ultraviolet lithography process and mask | Oct 26, 15 | Aug 15, 17 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
9696619 | Technique for repairing a reflective photo-mask | Mar 11, 15 | Jul 04, 17 | DINO TECHNOLOGY ACQUISITION LLC |
9599888 | Reflective lithography masks and systems and methods | Feb 03, 16 | Mar 21, 17 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
9586850 | Method for producing titanium-doped silica glass for use in EUV lithography and blank produced in accordance therewith | Jul 22, 14 | Mar 07, 17 | HERAEUS QUARZGLAS GMBH & CO. KG |
9588419 | Extreme ultraviolet light (EUV) photomasks and fabrication methods thereof | Jul 27, 15 | Mar 07, 17 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
9583709 | Mask for forming organic layer pattern, forming method of organic layer pattern, and manufacturing method of organic light emitting diode display using the same | Nov 04, 14 | Feb 28, 17 | SAMSUNG DISPLAY CO., LTD. |
9557636 | Extreme ultraviolet lithography mask and multilayer deposition method for fabricating same | Sep 08, 14 | Jan 31, 17 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
9507254 | Method of manufacturing substrate with a multilayer reflective film, method of manufacturing a reflective mask blank, substrate with a multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing a semiconductor device | Sep 24, 13 | Nov 29, 16 | HOYA CORPORATION |
9470872 | Reflective optical element | Oct 30, 14 | Oct 18, 16 | CARL ZEISS SMT GMBH |
9454073 | Photomask blank and photomask for suppressing heat absorption | Nov 21, 14 | Sep 27, 16 | SK HYNIX INC. |
9341938 | Mask plate, exposure system and exposing method | Dec 12, 13 | May 17, 16 | BOE TECHNOLOGY GROUP CO., LTD., CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD., |
9341941 | Reflective photomask blank, reflective photomask, and integrated circuit device manufactured by using reflective photomask | Jul 21, 14 | May 17, 16 | SAMSUNG ELECTRONICS CO., LTD. |
9261792 | Reflective lithography masks and systems and methods | Jul 25, 14 | Feb 16, 16 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
9195143 | Mask plate and exposing method | Jul 03, 13 | Nov 24, 15 | BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD. |
9140979 | Mask | Jan 23, 12 | Sep 22, 15 | LG CHEM, LTD. |
9134604 | Extreme ultraviolet (EUV) mask and method of fabricating the EUV mask | Aug 30, 13 | Sep 15, 15 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
9034665 | Tool configuration and method for extreme ultra-violet (EUV) patterning with a deformable reflective surface | Oct 11, 13 | May 19, 15 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
8940463 | Method and apparatus for EUV mask having diffusion barrier | Mar 14, 13 | Jan 27, 15 | INTERMOLECULAR, INC. |
8936889 | Method and apparatus for EUV mask having diffusion barrier | Mar 14, 13 | Jan 20, 15 | INTERMOLECULAR, INC. |