| 9996000 | Test pattern layout for test photomask and method for evaluating critical dimension changes | Apr 08, 16 | Jun 12, 18 | International Business Machine Corporation; Toppan Printing Co., Ltd.; |
| 9989843 | Test pattern layout for test photomask and method for evaluating critical dimension changes | Apr 08, 16 | Jun 05, 18 | International Business Machine Corporation; Toppan Printing Co., Ltd.; |
| 9983480 | Method of manufacturing a structure on a substrate | Sep 20, 16 | May 29, 18 | Ushio Denki Kabushiki Kaisha |
| 9982333 | Mask frame assembly and method of manufacturing the same | Mar 03, 15 | May 29, 18 | Samsung Display Co., Ltd. |
| 9978595 | Photo mask and exposure system | Feb 16, 16 | May 22, 18 | BOE Technology Group Co. Ltd.; Chengdu Boe Optoelectronics Technology Co., Ltd.; |
| 9952501 | Photomask blank, making method, and photomask | Sep 02, 16 | Apr 24, 18 | Shin-Etsu Chemical Co. Ltd. |
| 9946151 | Method for producing a mask and the mask | Aug 11, 15 | Apr 17, 18 | BOE Technology Group Co. Ltd. |
| 9904169 | Photomask blank, resist pattern forming process, and method for making photomask | Apr 04, 16 | Feb 27, 18 | SHIN-ETSU CHEMICAL CO., LTD. |
| 9905762 | Display substrate and fabricating method thereof, and system for fabricating display substrate and display device | Apr 01, 16 | Feb 27, 18 | BOE TECHNOLOGY GROUP CO., LTD., ORDOS YUANSHENG OPTOELECTRONICS CO., LTD., |
| 9897909 | Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method | Apr 21, 16 | Feb 20, 18 | HOYA CORPORATION |
| 9891463 | Mask for forming color filter layer, method for fabricating color filter substrate, and color filter substrate | Jun 14, 13 | Feb 13, 18 | BEIJING BOE DISPLAY TECHNOLOGY CO., LTD., BOE TECHNOLOGY GROUP CO., LTD., |
| 9881808 | Mask and pattern forming method | Dec 28, 15 | Jan 30, 18 | TOSHIBA MEMORY CORPORATION |
| 9880461 | Method for manufacturing master mold, master mold manufactured thereby, method for manufacturing transparent photomask, transparent photomask manufactured thereby, and method for forming conductive mesh pattern using transparent photomask | Feb 13, 15 | Jan 30, 18 | LG CHEM, LTD. |
| 9874808 | Mask blank, mask blank with negative resist film, phase shift mask, and method for producing pattern formed body using same | Aug 21, 14 | Jan 23, 18 | DAI NIPPON PRINTING CO., LTD. |
| 9864266 | Photomask blank | Aug 17, 16 | Jan 09, 18 | SHIN-ETSU CHEMICAL CO., LTD. |
| 9864269 | Photomask blank | Aug 17, 16 | Jan 09, 18 | SHIN-ETSU CHEMICAL CO., LTD. |
| 9857687 | Method of manufacturing substrate and substrate and mask film | Feb 26, 14 | Jan 02, 18 | YAMATOYA & CO., LTD., TOKAI SHINEI ELECTRONICS INDUSTRY CO., LTD., TOKAI SHINEI ELECTRONICS INIDUSTRY CO., LTD, |
| 9851633 | Inorganic material film, photomask blank, and method for manufacturing photomask | Jun 23, 16 | Dec 26, 17 | SHIN-ETSU CHEMICAL CO., LTD. |
| 9841669 | Method for forming conductive mesh pattern, and mesh electrode and laminate manufactured thereby | Feb 13, 15 | Dec 12, 17 | LG CHEM, LTD. |
| 9835939 | Gray-tone masks and the manufacturing method thereof | Jun 30, 15 | Dec 05, 17 | SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD. |