G03F 1/34

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Patent/Pub #TitleFiling DateIssue/Publication DatePatent Owner
9885950 Phase shift mask, method for manufacturing the same, and method for forming micro patternApr 20, 15Feb 06, 18SAMSUNG DISPLAY CO., LTD.
9465296 Nanopatterning method and apparatusJul 11, 12Oct 11, 16METAMATERIAL TECHNOLOGIES USA, INC.
9201311 Methods and patterning devices for measuring phase aberrationJun 26, 12Dec 01, 15ASML NETHERLANDS B.V.
8685597 Forming a bridging feature using chromeless phase-shift lithographyOct 07, 11Apr 01, 14SEAGATE TECHNOLOGY LLC
8603706 Forming a bridging feature using chromeless phase-shift lithographyOct 07, 11Dec 10, 13SEAGATE TECHNOLOGY LLC
8563199 Forming a bridging feature using chromeless phase-shift lithographyOct 07, 11Oct 22, 13SEAGATE TECHNOLOGY LLC
8389183 Chromeless phase-shifting photomask with undercut rim-shifting elementFeb 09, 10Mar 05, 13GLOBALFOUNDRIES INC.