G03F 1/30

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Patent/Pub #TitleFiling DateIssue/Publication DatePatent Owner
9977324 Phase shift mask and method of forming patterns using the sameMar 20, 17May 22, 18Samsung Display Co., Ltd.
9651857 Mask and method for forming the sameMar 03, 15May 16, 17TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
9541823 Photomask blankDec 05, 14Jan 10, 17SHIN-ETSU CHEMICAL CO., LTD.
9488907 Photomask blank, process for production of photomask, and chromium-containing material filmJan 08, 15Nov 08, 16SHIN-ETSU CHEMICAL CO., LTD.
9482965 Transmission balancing for phase shift mask with a trim maskMay 02, 16Nov 01, 16SEAGATE TECHNOLOGY LLC
9436092 Semiconductor fabrication utilizing grating and trim masksDec 12, 12Sep 06, 16NEWPORT FAB, LLC DBA JAZZ SEMICONDUCTOR
9390934 Phase shift mask, method of forming asymmetric pattern, method of manufacturing diffraction grating, and method of manufacturing semiconductor deviceSep 13, 12Jul 12, 16HITACHI HIGH-TECHNOLOGIES CORPORATION
9341939 Transmission balancing for phase shift mask with a trim maskOct 30, 14May 17, 16SEAGATE TECHNOLOGY LLC
9188852 Photomask blank, method for manufacturing photomask, and method for manufacturing phase shift maskMay 13, 13Nov 17, 15SHIN-ETSU CHEMICAL CO., LTD.
9091931 Photomask blank and method for manufacturing photomaskJun 12, 12Jul 28, 15SHIN-ETSU CHEMICAL CO., LTD., TOPPAN PRINTING CO., LTD.,
9075317 Photomasks, methods of forming a photomask, and methods of photolithographically patterning a substrateSep 09, 14Jul 07, 15MICRON TECHNOLOGY, INC.
8982326 Exposure system, method of forming pattern using the same and method of manufacturing display substrate using the sameOct 16, 12Mar 17, 15SAMSUNG DISPLAY CO., LTD.
8977989 Handling of flat data for phase processing including growing shapes within bins to identify clustersJan 12, 09Mar 10, 15SYNOPSYS, INC.
8968972 Photomask blank, process for production of photomask, and chromium-containing material filmNov 18, 11Mar 03, 15SHIN-ETSU CHEMICAL CO., LTD.
8920666 Etching method and photomask blank processing methodMay 14, 10Dec 30, 14SHIN-ETSU CHEMICAL CO., LTD.
8875063 Mask layout formationOct 11, 10Oct 28, 14INFINEON TECHNOLOGIES AG, INTERNATIONAL BUSINESS MACHINES CORPORATION,
8846273 Photomasks, methods of forming a photomask, and methods of photolithographically patterning a substrateJun 04, 12Sep 30, 14MICRON TECHNOLOGY, INC.
8323859 Optical compensation devices, systems, and methodsNov 18, 11Dec 04, 12MICRON TECHNOLOGY, INC.
8273506 Method of manufacturing optical element, and optical elementMar 05, 10Sep 25, 12HOYA CORPORATION