| 9995999 | Lithography mask | Jun 13, 16 | Jun 12, 18 | Taiwan Semiconductor Manufacturing Company Ltd. |
| 9996013 | Extreme ultraviolet lithography process and mask | Jun 27, 16 | Jun 12, 18 | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 9989844 | Pellicle for reticle and multilayer mirror | Sep 29, 16 | Jun 05, 18 | ASML NETHERLANDS B.V. |
| 9977323 | Reflective mask and method for manufacturing reflective mask | Aug 29, 16 | May 22, 18 | TOSHIBA MEMORY CORPORATION |
| 9946151 | Method for producing a mask and the mask | Aug 11, 15 | Apr 17, 18 | BOE Technology Group Co. Ltd. |
| 9946150 | Light reflection type lithography mask, its manufacturing method, mask data generation method and mask blank | Sep 08, 15 | Apr 17, 18 | TOSHIBA MEMORY CORPORATION |
| 9946152 | Extreme ultraviolet lithography photomasks | Apr 27, 16 | Apr 17, 18 | Globalfoundries Inc. |
| 9927693 | Reflective mask blank and process for producing the reflective mask blank | Sep 15, 16 | Mar 27, 18 | ASAHI GLASS COMPANY LIMITED |
| 9927692 | Reflective photomask and production method therefor | Mar 01, 16 | Mar 27, 18 | Toppan Printing Co Ltd. |
| 9921466 | Method for monitoring focus in EUV lithography | Jan 25, 17 | Mar 20, 18 | INTERNATIONAL BUSINESS MACHINES CORPORATION |
| 9921465 | Reflective mask, reflective mask blank and manufacturing method therefor | Mar 16, 16 | Mar 20, 18 | TOPPAN PRINTING CO., LTD. |
| 9905593 | Mask plate and method for manufacturing array substrate | Jul 28, 15 | Feb 27, 18 | BOE TECHNOLOGY GROUP CO., LTD., HEFEI BOE OPTOELECTRONICS TECHNOLOGY CO., LTD., |
| 9904164 | Glass substrate for mask blank | Jan 21, 16 | Feb 27, 18 | ASAHI GLASS COMPANY, LIMITED |
| 9897910 | Treating a capping layer of a mask | Dec 30, 16 | Feb 20, 18 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 9891520 | Use of surfactants having at least three short-chain perfluorinated groups in formulations for photo mask cleaning | Jul 08, 14 | Feb 13, 18 | BASF SE |
| 9886543 | Method providing for asymmetric pupil configuration for an extreme ultraviolet lithography process | Feb 10, 16 | Feb 06, 18 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 9874809 | Pellicle for a reflective mask and reflective mask assembly including the same | Jun 16, 16 | Jan 23, 18 | SAMSUNG ELECTRONICS CO., LTD. |
| 9870612 | Method for repairing a mask | Sep 01, 16 | Jan 16, 18 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 9869928 | Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof | Apr 11, 16 | Jan 16, 18 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 9864267 | Reflective mask blank, reflective mask, and method for manufacturing semiconductor device | Nov 26, 14 | Jan 09, 18 | HOYA CORPORATION |