G03F 1/22

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Patent/Pub #TitleFiling DateIssue/Publication DatePatent Owner
9995999 Lithography maskJun 13, 16Jun 12, 18Taiwan Semiconductor Manufacturing Company Ltd.
9989860 Method of generating a pattern on a photomask using a plurality of beams and pattern generator for performing the sameSep 02, 16Jun 05, 18Samsung Electronics Co., Ltd.
9984858 ALE smoothness: in and outside semiconductor industryAug 31, 16May 29, 18Lam Research Corporation
9952503 Method for repairing a maskMar 21, 16Apr 24, 18Taiwan Semiconductor Manufacturing Company, Ltd.
9946152 Extreme ultraviolet lithography photomasksApr 27, 16Apr 17, 18Globalfoundries Inc.
9927692 Reflective photomask and production method thereforMar 01, 16Mar 27, 18Toppan Printing Co Ltd.
9921465 Reflective mask, reflective mask blank and manufacturing method thereforMar 16, 16Mar 20, 18TOPPAN PRINTING CO., LTD.
9915866 Focused radiation beam induced depositionNov 16, 15Mar 13, 18TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
9910350 Method for repairing a maskNov 16, 15Mar 06, 18TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
9897909 Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication methodApr 21, 16Feb 20, 18HOYA CORPORATION
9899528 Manufacturing method for TFT array substrate, TFT array substrate and display deviceOct 21, 15Feb 20, 18SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD., WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD,
9891520 Use of surfactants having at least three short-chain perfluorinated groups in formulations for photo mask cleaningJul 08, 14Feb 13, 18BASF SE
9880460 Enhanced EUV lithography systemJul 15, 16Jan 30, 18TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
9880459 Photomask blank and method for preparing photomaskJul 11, 16Jan 30, 18SHIN-ETSU CHEMICAL CO., LTD.
9869928 Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereofApr 11, 16Jan 16, 18TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
9863761 Critical dimension uniformity monitoring for extreme ultraviolet reticlesApr 16, 13Jan 09, 18KLA-TENCOR CORPORATION
9846357 Photomask manufacturing method and photomaskSep 02, 14Dec 19, 17TOSHIBA MEMORY CORPORATION, IMMEDIA SEMICONDUCTOR, INC.,
9835939 Gray-tone masks and the manufacturing method thereofJun 30, 15Dec 05, 17SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
9829785 Extreme ultraviolet lithography process and maskDec 13, 13Nov 28, 17TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
9817306 Extreme ultraviolet (EUV) pod having marksSep 23, 15Nov 14, 17GUDENG PRECISION INDUSTRIAL CO., LTD.

Showing 1 to 20 of 185 results