| 9989860 | Method of generating a pattern on a photomask using a plurality of beams and pattern generator for performing the same | Sep 02, 16 | Jun 05, 18 | Samsung Electronics Co., Ltd. |
| 9964846 | Two-dimensional heterostructure materials | Jul 20, 16 | May 08, 18 | UT - Battelle LLC |
| 9931666 | Mask assembly having frame with support stick | Jan 28, 14 | Apr 03, 18 | Samsung Display Co., Ltd |
| 9927698 | Dual exposure patterning of a photomask to print a contact, a via or curvilinear shape on an integrated circuit | Aug 11, 16 | Mar 27, 18 | Globalfoundries Inc. |
| 9897908 | Ebeam three beam aperture array | Dec 19, 14 | Feb 20, 18 | INTEL CORPORATION |
| 9880459 | Photomask blank and method for preparing photomask | Jul 11, 16 | Jan 30, 18 | SHIN-ETSU CHEMICAL CO., LTD. |
| 9864266 | Photomask blank | Aug 17, 16 | Jan 09, 18 | SHIN-ETSU CHEMICAL CO., LTD. |
| 9864269 | Photomask blank | Aug 17, 16 | Jan 09, 18 | SHIN-ETSU CHEMICAL CO., LTD. |
| 9852884 | Information processing apparatus, information processing method, and storage medium | Feb 06, 15 | Dec 26, 17 | NIPPON CONTROL SYSTEM CORPORATION |
| 9824855 | Information processing apparatus, information processing method, and storage medium | Feb 06, 15 | Nov 21, 17 | NIPPON CONTROL SYSTEM CORPORATION |
| 9740098 | Chemically amplified negative resist composition using novel onium salt and resist pattern forming process | Apr 08, 16 | Aug 22, 17 | SHIN-ETSU CHEMICAL CO., LTD. |
| 9715169 | Method and system for forming a pattern on a reticle using charged particle beam lithography | May 17, 16 | Jul 25, 17 | D2S, Inc. |
| 9625809 | Method and system for forming patterns using charged particle beam lithography with variable pattern dosage | Jun 16, 16 | Apr 18, 17 | D2S, Inc. |
| 9625813 | Chemical amplification resist composition, resist film using the composition, resist-coated mask blanks, resist pattern forming method, photomask and polymer compound | Jul 16, 13 | Apr 18, 17 | FUJIFILM CORPORATION |
| 9541900 | Method for producing a beam shaping holographic optical element | Dec 26, 13 | Jan 10, 17 | COVESTRO DEUTSCHLAND AG, LG DISPLAY CO., LTD., |
| 9535316 | Photomask with three states for forming multiple layer patterns with a single exposure | Sep 18, 13 | Jan 03, 17 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 9530610 | Blanking aperture array device for multi-beams, and fabrication method of blanking aperture array device for multi-beams | Nov 30, 15 | Dec 27, 16 | NTT ADVANCED TECHNOLOGY CORPORATION, NUFLARE TECHNOLOGY, INC., |
| 9465297 | Method and system for forming patterns with charged particle beam lithography | May 18, 15 | Oct 11, 16 | D2S, Inc. |
| 9429835 | Structure and method of photomask with reduction of electron-beam scatterring | Feb 12, 14 | Aug 30, 16 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 9411225 | Photo acid generator, chemically amplified resist composition, and patterning process | Jun 02, 15 | Aug 09, 16 | SHIN-ETSU CHEMICAL CO., LTD. |