| RE50296 | Electron beam resist composition | Jul 21, 21 | Feb 11, 25 | The University of Manchester |
| RE49732 | Charged particle lithography system with alignment sensor and beam measurement sensor | May 30, 19 | Nov 21, 23 | ASML Netherlands B.V. |
| RE49725 | Method and arrangement for handling and processing substrates | Sep 18, 20 | Nov 14, 23 | ASML Netherlands B.V. |
| RE49488 | Lithography system, method of clamping and wafer table | May 30, 19 | Apr 11, 23 | ASML Netherlands B.V. |
| RE49297 | Lithographic apparatus and a device manufacturing method | Oct 18, 19 | Nov 15, 22 | ASML Netherlands B.V. |
| RE49241 | Lithography system and method for processing a target, such as a wafer | Sep 11, 19 | Oct 11, 22 | ASML Netherlands B.V. |
| RE49199 | Inspection method and apparatus and lithographic processing cell | Feb 23, 15 | Sep 06, 22 | ASML Netherlands B.V. |
| RE49142 | Lithographic apparatus and an object positioning system | Oct 02, 19 | Jul 19, 22 | ASML Netherlands B.V. |
| RE49066 | Chucks and clamps for holding objects of a lithographic apparatus and methods for controlling a temperature of an object held by a clamp of a lithographic apparatus | Feb 28, 20 | May 10, 22 | ASML Holding N.V.; ASML Netherlands B.V.; |
| RE48903 | Apparatus for transferring a substrate in a lithography system | Feb 21, 19 | Jan 25, 22 | ASML Netherlands B.V. |
| RE48676 | Lithographic apparatus, fluid handling structure for use in a lithographic apparatus and device manufacturing method | Nov 29, 18 | Aug 10, 21 | ASML Netherlands B.V. |
| RE48515 | Method and device for irradiating spots on a layer | May 16, 17 | Apr 13, 21 | ASML Netherlands B.V. |
| RE48429 | Substrate holding method, substrate holding apparatus, exposure apparatus and exposure method | Jun 08, 18 | Feb 09, 21 | Nikon Corporation |
| RE47535 | Method and apparatus for accommodating device and/or signal mismatch in a sensor array | Apr 09, 14 | Jul 23, 19 | Dolby Laboratories Licensing Corporation |
| RE47483 | Template having a varying thickness to facilitate expelling a gas positioned between a substrate and the template | Oct 14, 15 | Jul 02, 19 | Molecular Imprints, Inc.; Canon Nanotechnologies, Inc.; |
| RE47456 | Pattern transfer apparatus and method for fabricating semiconductor device | Apr 29, 16 | Jun 25, 19 | TOSHIBA MEMORY CORPORATION |
| RE47271 | Imprint recipe creating device and imprint device | Jun 03, 16 | Mar 05, 19 | TOSHIBA MEMORY CORPORATION |
| RE47272 | Methods of determining quality of a light source | May 24, 16 | Mar 05, 19 | Taiwan Semiconductor Manufacturing Co Ltd. |
| RE47197 | Methods of determining quality of a light source | May 21, 14 | Jan 08, 19 | Taiwan Semiconductor Manufacturing Co Ltd. |
| RE46901 | Drop recipe creating method, database creating method and medium | Oct 14, 15 | Jun 19, 18 | TOSHIBA MEMORY CORPORATION |