| 2024/0405,030 | ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF, MASK, AND DISPLAY APPARATUS | Sep 27, 22 | Dec 05, 24 | Not available |
| 2024/0067,558 | HOMOGENOUS SILICA-TITANIA GLASS | Aug 21, 23 | Feb 29, 24 | Not available |
| 2024/0012,324 | PHOTOMASK HAVING RECESSED REGION | Sep 22, 23 | Jan 11, 24 | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 2021/0132,500 | METHOD FOR MAKING PHOTOLITHOGRAPHY MASK PLATE | Jan 15, 21 | May 06, 21 | Not available |
| 2020/0346,982 | POWDER FOR ADDITIVE MODELING, STRUCTURE, SEMICONDUCTOR PRODUCTION DEVICE COMPONENT, AND SEMICONDUCTOR PRODUCTION DEVICE | Jul 23, 20 | Nov 05, 20 | Not available |
| 2020/0341,365 | EUV PELLICLES | Nov 06, 18 | Oct 29, 20 | ASML NETHERLANDS B.V. |
| 2020/0292,932 | RETICLE AND METHOD OF DETECTING INTACTNESS OF RETICLE STAGE USING THE SAME | Mar 14, 19 | Sep 17, 20 | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 2020/0166,831 | PELLICLE AND METHOD FOR MANUFACTURING PELLICLE | Aug 01, 18 | May 28, 20 | Not available |
| 2020/0117,104 | MASK PATTERN CORRECTION SYSTEM, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD UTILIZING SAID CORRECTION SYSTEM | Sep 10, 19 | Apr 16, 20 | TOSHIBA MEMORY CORPORATION |
| 2020/0089,098 | PHOTOMASK AND METHOD FOR FORMING THE SAME | Sep 18, 18 | Mar 19, 20 | Not available |
| 2020/0057,362 | PHOTOMASK LASER ETCH | Jul 12, 19 | Feb 20, 20 | Not available |
| 2020/0004,132 | SHIFTING OF PATTERNS TO REDUCE LINE WAVINESS | Jun 28, 18 | Jan 02, 20 | Not available |
| 2019/0369,480 | OPTIMIZATION OF A LITHOGRAPHY APPARATUS OR PATTERNING PROCESS BASED ON SELECTED ABERRATION | Aug 30, 17 | Dec 05, 19 | ASML NETHERLANDS B.V. |
| 2019/0259,600 | MECHANISMS FOR FORMING PATTERNS USING MULTIPLE LITHOGRAPHY PROCESSES | Apr 29, 19 | Aug 22, 19 | Not available |
| 2019/0187,552 | OPTICAL PROXIMITY CORRECTION (OPC) METHOD AND METHOD OF MANUFACTURING MASK BY USING THE OPC METHOD | Jul 05, 18 | Jun 20, 19 | Not available |
| 2019/0011,827 | METHOD OF MANUFACTURING CHEMICAL FLUID FOR MANUFACTURING ELECTRONIC MATERIAL, PATTERN FORMING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, CHEMICAL FLUID FOR MANUFACTURING ELECTRONIC MATERIAL, CONTAINER, AND QUALITY INSPECTION METHOD | Sep 13, 18 | Jan 10, 19 | FUJIFILM Corporation |
| 2018/0335,692 | PHASE-SHIFT BLANKMASK AND PHASE-SHIFT PHOTOMASK | May 09, 18 | Nov 22, 18 | S&S TECH CO., LTD. |
| 2018/0321,582 | PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK | Jul 12, 18 | Nov 08, 18 | Not available |
| 2018/0322,224 | METHODS AND SYSTEMS FOR PARAMETER-SENSITIVE AND ORTHOGONAL GAUGE DESIGN FOR LITHOGRAPHY CALIBRATION | Jul 16, 18 | Nov 08, 18 | ASML NETHERLANDS B.V. |
| 2018/0267,397 | MASK STRUCTURE AND COA TYPE ARRAY SUBSTRATE | Apr 17, 17 | Sep 20, 18 | Not available |