H01L 21/205

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Class  H01L : SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR


Subclass 21/205: Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer the devices having semiconductor bodies comprising elements of the fourth group of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials Deposition of semiconductor materials on a substrate, e.g. epitaxial growth using reduction or decomposition of a gaseous compound yielding a solid condensate, i.e. chemical deposition

Recent Patents

Patent #TitleFiling DateIssue DatePatent Owner
11819838 Precursor supply system and precursors supply methodMar 28, 17Nov 21, 23L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
11708646 Crucible having an improved crystal growth base for manufacturing silicon carbide single crystal and method of useDec 27, 21Jul 25, 23EC-Showa Denko K.K.
11703643 Integrated photonics including waveguiding materialDec 17, 19Jul 18, 23The Research Foundation for the State University of New York
11692266 SiC chemical vapor deposition apparatusDec 17, 19Jul 04, 23EC-Showa Denko K.K.
11680318 Vapor delivery device, methods of manufacture and methods of use thereofMay 31, 22Jun 20, 23Edwards Semiconductor Solutions LLC
11674159 Methods and compositions for RNA-directed target DNA modification and for RNA-directed modulation of transcriptionApr 01, 21Jun 13, 23The Regents of the University of California; University of Vienna;
11591717 Vapor phase epitaxial growth deviceSep 07, 18Feb 28, 23National University Corporation Nagoya University; Toyoda Gosei Co., Ltd.;
11592025 Dry pump and exhaust gas treatment methodJul 06, 15Feb 28, 23Edwards Japan Limited
11549127 Methods and compositions for RNA-directed target DNA modification and for RNA-directed modulation of transcriptionMar 24, 22Jan 10, 23The Regents of the University of California; University of Vienna; Emmanuelle Charpentier;
11538683 Method for depositing an epitaxial layer on a front side of a semiconductor wafer and device for carrying out the methodNov 28, 18Dec 27, 22Siltronic AG
11532494 System for coating a substrateOct 29, 21Dec 20, 22Service Support Specialties, Inc
11512392 Substrate processing apparatusAug 29, 19Nov 29, 22Kokusai Electric Corporation
11508629 Nitride semiconductor laminate, method for manufacturing nitride semiconductor laminate, method for manufacturing semiconductor laminate, and method for inspecting semiconductor laminateApr 03, 17Nov 22, 22SUMITOMO CHEMICAL COMPANY, LIMITED
11488871 Transistor structure with multiple halo implants having epitaxial layer over semiconductor-on-insulator substrateSep 19, 17Nov 01, 22Not available
11473212 Group 13 (III) nitride thick layer formed on an underlying layer having high and low carrier concentration regions with different defect densitiesMay 29, 18Oct 18, 22NGK INSULATORS, LTD.
11462409 Epitaxial silicon wafer, and method for manufacturing epitaxial silicon waferAug 07, 17Oct 04, 22Sumco Corporation
11450737 Nanorod production method and nanorod produced therebyMar 02, 20Sep 20, 22Samsung Display Co., Ltd.
11434565 Cleaning method of semiconductor manufacturing deviceMar 29, 17Sep 06, 22Kanto Denka Kogyo Co. Ltd.
11427929 Wafer supporting mechanism, chemical vapor deposition apparatus, and epitaxial wafer manufacturing methodDec 12, 16Aug 30, 22EC-Showa Denko K.K.
11414759 Mechanisms for supplying process gas into wafer process apparatusNov 29, 13Aug 16, 22Taiwan Semiconductor Manufacturing Co Ltd.

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Recent Publications

Publication #TitleFiling DatePub DatePatent Owner
2022/0384,192 EPITAXIAL GROWTH DEVICEJun 10, 22Dec 01, 22Not available
2022/0319,851 EPITAXIAL SILICON WAFER FOR MANUFACTURING SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING EPITAXIAL SILICON WAFER FOR MANUFACTURING SEMICONDUCTOR DEVICEJun 24, 22Oct 06, 22Sumco Corporation
2022/0181,156 SiC EPITAXIAL SUBSTRATE MANUFACTURING METHOD AND MANUFACTURING DEVICE THEREFORMar 03, 20Jun 09, 22Not available
2022/0059,350 SOURCE/DRAIN STRUCTURE FOR SEMICONDUCTOR DEVICEAug 18, 20Feb 24, 22Taiwan Semiconductor Manufacturing Co., Ltd.
2022/0005,696 SiC EPITAXIAL GROWTH APPARATUSSep 16, 21Jan 06, 22Not available
2020/0335,342 METHODS FOR DEPOSITING THIN FILMS COMPRISING INDIUM NITRIDE BY ATOMIC LAYER DEPOSITIONJun 22, 20Oct 22, 20Not available
2020/0051,817 EPITAXIAL SILICON WAFER AND METHOD FOR MANUFACTURING EPITAXIAL SILICON WAFERSep 12, 17Feb 13, 20Sumco Corporation
2019/0228,972 MANUFACTURING METHOD OF NITRIDE SEMICONDUCTOR ULTRAVIOLET LIGHT EMITTING ELEMENT, AND NITRIDE SEMICONDUCTOR ULTRAVIOLET LIGHT EMITTING ELEMENTNov 08, 17Jul 25, 19Soko Kagaku Co., Ltd.
2019/0206,686 COMPONENT FOR FABRICATING SIC SEMICONDUCTOR, HAVING PLURALITY OF LAYERS HAVING DIFFERENT TRANSMITTANCES, AND METHOD FOR MANUFACTURING SAMEAug 18, 17Jul 04, 19TOKAI CARBON KOREA CO., LTD.
2019/0206,685 VAPOR PHASE GROWTH APPARATUS, METHOD OF MANUFACTURING EPITAXIAL WAFER, AND ATTACHMENT FOR VAPOR PHASE GROWTH APPARATUSJul 06, 17Jul 04, 19Not available
2019/0103,273 Method for Producing Group III Nitride LaminateMar 15, 17Apr 04, 19Stanley Electric Co., Ltd.
2018/0237,942 METHOD FOR MANUFACTURING SILICON CARBIDE EPITAXIAL SUBSTRATE, METHOD FOR MANUFACTURING SILICON CARBIDE SEMICONDUCTOR DEVICE, AND APPARATUS FOR MANUFACTURING SILICON CARBIDE EPITAXIAL SUBSTRATEAug 02, 16Aug 23, 18Not available
2018/0218,905 APPLYING EQUALIZED PLASMA COUPLING DESIGN FOR MURA FREE SUSCEPTORJan 30, 18Aug 02, 18Not available
2018/0122,638 SUBSTRATE PROCESSING APPARATUSApr 19, 16May 03, 18Not available
2018/0090,323 SUBSTRATE PROCESSING APPARATUSApr 12, 16Mar 29, 18Not available
2018/0053,683 LIFT PIN AND METHOD FOR MANUFACTURING SAMEJan 22, 16Feb 22, 18KOMICO CO., LTD.
2017/0372,902 CRYSTAL PRODUCTION SYSTEMS AND METHODSDec 23, 15Dec 28, 17SITEC GMBH
2012/0175,613 POLYCRYSTALLINE SILICON MASS AND PROCESS FOR PRODUCING POLYCRYSTALLINE SILICON MASSJul 21, 10Jul 12, 12SHIN-ETSU CHEMICAL CO., LTD.

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