Class G03F : PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
Subclass 1/54: Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Absorbers, e.g. opaque materials
| Patent # | Title | Filing Date | Issue Date | Patent Owner |
|---|---|---|---|---|
| 12222639 | Extreme ultraviolet mask and method of manufacturing the same | Jul 20, 23 | Feb 11, 25 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 12216398 | Reflective mask blank and reflective mask | Jan 19, 24 | Feb 04, 25 | AGC INC. |
| 12210279 | Electroconductive-film-coated substrate and reflective mask blank | May 24, 22 | Jan 28, 25 | AGC Inc. |
| 12209046 | Glass substrate for EUVL, manufacturing method thereof, mask blank for EUVL, and manufacturing method thereof | Apr 30, 21 | Jan 28, 25 | AGC Inc. |
| 12147154 | EUV photo masks and manufacturing method thereof | Apr 03, 23 | Nov 19, 24 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 12124162 | Substrate with film for reflective mask blank, reflective mask blank, and method for manufacturing reflective mask | Sep 12, 22 | Oct 22, 24 | Shin-Etsu Chemical Co. Ltd. |
| 12124163 | Mask defect prevention | Jul 27, 23 | Oct 22, 24 | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 12111565 | Reflective photomask blank and reflective photomask | May 28, 20 | Oct 08, 24 | TOPPAN INC. |
| 12092952 | Methods for forming extreme ultraviolet mask comprising magnetic material | Jun 14, 21 | Sep 17, 24 | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 12066757 | Mask and method of forming the same | Apr 27, 23 | Aug 20, 24 | Taiwan Semiconductor Manufacturing Company Ltd. |
| 12019367 | Mask blanks and methods for depositing layers on mask blank | Dec 19, 22 | Jun 25, 24 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 12013631 | Mask blank, transfer mask, and method for manufacturing semiconductor device | Dec 02, 22 | Jun 18, 24 | 501 Hoya Corporation |
| 12001132 | Protection layer on low thermal expansion material (LTEM) substrate of extreme ultraviolet (EUV) mask | Aug 07, 19 | Jun 04, 24 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 12001133 | Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective mask | Oct 20, 23 | Jun 04, 24 | AGC Inc. |
| 11982936 | Photomask and method of fabricating a photomask | Jun 30, 22 | May 14, 24 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 11947255 | Method for making photolithography mask plate | Jan 15, 21 | Apr 02, 24 | Tsinghua University; Hon Hai Precision Industry Co., Ltd; |
| 11914283 | Reflective mask blank and reflective mask | Apr 11, 22 | Feb 27, 24 | AGC INC. |
| 11892768 | Reflective mask blank, reflective mask and method of manufacturing the same, and method of manufacturing semiconductor device | Aug 08, 19 | Feb 06, 24 | 501 Hoya Corporation |
| 11860532 | Photomask including fiducial mark and method of making a semiconductor device using the photomask | Jul 26, 22 | Jan 02, 24 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 11860530 | Mask defect prevention | Jun 30, 22 | Jan 02, 24 | Taiwan Semiconductor Manufacturing Co., Ltd. |
| Publication # | Title | Filing Date | Pub Date | Patent Owner |
|---|---|---|---|---|
| 2025/0116,920 | ELECTROCONDUCTIVE-FILM-COATED SUBSTRATE AND REFLECTIVE MASK BLANK | Dec 16, 24 | Apr 10, 25 | AGC Inc. |
| 2025/0036,020 | REFLECTIVE MASK BLANK, REFLECTIVE MASK BLANK MANUFACTURING METHOD, REFLECTIVE MASK, AND REFLECTIVE MASK MANUFACTURING METHOD | Oct 09, 24 | Jan 30, 25 | AGC Inc. |
| 2025/0036,021 | EXTREME ULTRAVIOLET LITHOGRAPHY METHOD AND EUV PHOTOMASK | Jul 28, 23 | Jan 30, 25 | Not available |
| 2024/0411,219 | REFLECTIVE PHOTOMASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASK | May 28, 24 | Dec 12, 24 | Shin-Etsu Chemical Co., Ltd. |
| 2024/0393,674 | METHODS FOR FORMING EXTREME ULTRAVIOLET MASK COMPRISING MAGNETIC MATERIAL | Jul 30, 24 | Nov 28, 24 | Not available |
| 2024/0385,507 | MASK DEFECT PREVENTION | Jul 29, 24 | Nov 21, 24 | Not available |
| 2024/0385,506 | EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF | Jul 29, 24 | Nov 21, 24 | Taiwan Semiconductor Manufacturing Company Ltd. |
| 2024/0377,719 | SUBSTRATE WITH MULTILAYER REFLECTIVE FILM REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | Sep 22, 22 | Nov 14, 24 | 501 Hoya Corporation |
| 2024/0377,720 | EUV Lithography Mask With A Porous Reflective Multilayer Structure | Jul 22, 24 | Nov 14, 24 | Not available |
| 2024/0377,722 | MASK AND METHOD OF FORMING THE SAME | Jul 22, 24 | Nov 14, 24 | Taiwan Semiconductor Manufacturing Company Ltd. |
| 2024/0319,582 | Optical Component with Apodized Mask | Mar 08, 24 | Sep 26, 24 | Not available |
| 2024/0288,763 | REFLECTIVE PHOTOMASK AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASK | Jun 02, 22 | Aug 29, 24 | Not available |
| 2024/0280,890 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD OF MANUFACTURING REFLECTIVE MASK | Apr 29, 24 | Aug 22, 24 | AGC Inc. |
| 2024/0248,388 | Substrate with Film for Reflective Mask Blank, and Reflective Mask Blank | Nov 09, 23 | Jul 25, 24 | Shin-Etsu Chemical Co., Ltd. |
| 2024/0241,434 | PHOTOMASKS HAVING INTERMEDIATE BARRIER LAYERS | Mar 28, 24 | Jul 18, 24 | Not available |
| 2024/0219,824 | REFLECTIVE MASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND A METHOD OF FABRICATING A SEMICONDUCTOR DEVICE USING THE SAME | Oct 25, 23 | Jul 04, 24 | Not available |
| 2024/0219,844 | METHOD AND APPARATUS FOR DETERMINING OPTICAL PROPERTIES OF DEPOSITION MATERIALS USED FOR LITHOGRAPHIC MASKS | Jan 30, 24 | Jul 04, 24 | Not available |
| 2024/0176,226 | METHOD FOR FABRICATING EUV MASK AND PHOTOMASK USING THE EUV MASK | Feb 05, 24 | May 30, 24 | Not available |
| 2024/0142,866 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD FOR MANUFACTURING REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | Mar 25, 22 | May 02, 24 | 501 Hoya Corporation |
| 2024/0085,779 | METHOD AND APPARATUS FOR QUALIFYING A MASK FOR USE IN LITHOGRAPHY | Sep 08, 23 | Mar 14, 24 | Not available |
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