Class G03F : PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
Subclass 1/52: Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Reflectors
| Patent # | Title | Filing Date | Issue Date | Patent Owner |
|---|---|---|---|---|
| 12216398 | Reflective mask blank and reflective mask | Jan 19, 24 | Feb 04, 25 | AGC INC. |
| 12209046 | Glass substrate for EUVL, manufacturing method thereof, mask blank for EUVL, and manufacturing method thereof | Apr 30, 21 | Jan 28, 25 | AGC Inc. |
| 12130548 | Extreme ultraviolet mask with reduced wafer neighboring effect | Jun 28, 23 | Oct 29, 24 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 12066757 | Mask and method of forming the same | Apr 27, 23 | Aug 20, 24 | Taiwan Semiconductor Manufacturing Company Ltd. |
| 12001132 | Protection layer on low thermal expansion material (LTEM) substrate of extreme ultraviolet (EUV) mask | Aug 07, 19 | Jun 04, 24 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 12001133 | Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective mask | Oct 20, 23 | Jun 04, 24 | AGC Inc. |
| 12001134 | Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective mask | Nov 22, 23 | Jun 04, 24 | AGC Inc. |
| 11982935 | Reflective mask blank for EUV lithography | Nov 17, 21 | May 14, 24 | AGC INC. |
| 11982936 | Photomask and method of fabricating a photomask | Jun 30, 22 | May 14, 24 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 11914283 | Reflective mask blank and reflective mask | Apr 11, 22 | Feb 27, 24 | AGC INC. |
| 11822229 | Reflective mask blank for EUV lithography, mask blank for EUV lithography, and manufacturing methods thereof | Jul 22, 21 | Nov 21, 23 | AGC Inc. |
| 11809075 | EUV lithography mask with a porous reflective multilayer structure | Aug 04, 21 | Nov 07, 23 | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 11774848 | Method and apparatus for repairing defects of a photolithographic mask for the EUV range | Jun 28, 21 | Oct 03, 23 | Carl Zeiss SMT GmbH |
| 11754917 | Extreme ultraviolet mask blank with multilayer absorber and method of manufacture | Apr 12, 21 | Sep 12, 23 | Applied Materials Inc. |
| 11740547 | Method of manufacturing extreme ultraviolet mask with reduced wafer neighboring effect | Apr 29, 21 | Aug 29, 23 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 11703751 | Reflective mask blank and reflective mask | Sep 01, 21 | Jul 18, 23 | AGC INC. |
| 11662656 | Mask and method of forming the same | Nov 23, 20 | May 30, 23 | Taiwan Semiconductor Manufacturing Company Ltd. |
| 11537039 | Photomask assembly with reflective photomask and method of manufacturing a reflective photomask | Jan 10, 20 | Dec 27, 22 | ADVANCED MASK TECHNOLOGY CENTER GMBH & CO. KG |
| 11435660 | Photomask and method of fabricating a photomask | Apr 30, 18 | Sep 06, 22 | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 11372322 | EUV mask blank, photomask manufactured by using the EUV mask blank, lithography apparatus using the photomask and method of fabricating semiconductor device using the photomask | Jan 06, 21 | Jun 28, 22 | Samsung Electronics Co., Ltd. |
| Publication # | Title | Filing Date | Pub Date | Patent Owner |
|---|---|---|---|---|
| 2025/0102,898 | REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK | Sep 04, 24 | Mar 27, 25 | Shin-Etsu Chemical Co., Ltd. |
| 2025/0036,020 | REFLECTIVE MASK BLANK, REFLECTIVE MASK BLANK MANUFACTURING METHOD, REFLECTIVE MASK, AND REFLECTIVE MASK MANUFACTURING METHOD | Oct 09, 24 | Jan 30, 25 | AGC Inc. |
| 2024/0427,226 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND MANUFACTURING METHOD THEREFOR | Sep 03, 24 | Dec 26, 24 | AGC Inc. |
| 2024/0377,720 | EUV Lithography Mask With A Porous Reflective Multilayer Structure | Jul 22, 24 | Nov 14, 24 | Not available |
| 2024/0377,722 | MASK AND METHOD OF FORMING THE SAME | Jul 22, 24 | Nov 14, 24 | Taiwan Semiconductor Manufacturing Company Ltd. |
| 2024/0295,807 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD OF MANUFACTURING REFLECTIVE MASK | Apr 29, 24 | Sep 05, 24 | AGC Inc. |
| 2024/0280,890 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD OF MANUFACTURING REFLECTIVE MASK | Apr 29, 24 | Aug 22, 24 | AGC Inc. |
| 2024/0248,387 | METHOD AND SYSTEM TO INTRODUCE BRIGHT FIELD IMAGING AT STITCHING AREA OF HIGH-NA EUV EXPOSURE | May 05, 23 | Jul 25, 24 | Not available |
| 2024/0201,576 | REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY | Feb 29, 24 | Jun 20, 24 | AGC Inc. |
| 2024/0152,003 | DISPLAY PANEL, METHOD OF MANUFACTURING DISPLAY PANEL, AND PHOTOMASK | Mar 29, 23 | May 09, 24 | TCL China Star Optoelectronics Technology Co.,Ltd. |
| 2024/0085,779 | METHOD AND APPARATUS FOR QUALIFYING A MASK FOR USE IN LITHOGRAPHY | Sep 08, 23 | Mar 14, 24 | Not available |
| 2022/0397,817 | REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK | Nov 25, 20 | Dec 15, 22 | Not available |
| 2022/0236,636 | REFLECTIVE MASK BLANK AND REFLECTIVE MASK | Apr 11, 22 | Jul 28, 22 | AGC INC. |
| 2021/0165,316 | PHOTOLITHOGRAPHY METHOD | Jun 19, 20 | Jun 03, 21 | Samsung Electronics Co., Ltd. |
| 2020/0073,224 | MASK AND METHOD FOR MANUFACTURING THE SAME AND METHOD FOR PATTERNING A LAYER | Jun 27, 19 | Mar 05, 20 | Not available |
| 2019/0384,162 | PHOTO-MASK AND METHOD FOR MANUFACTURING ACTIVE SWITCH ARRAY SUBSTRATE THEREOF | May 17, 17 | Dec 19, 19 | Not available |
| 2019/0179,225 | PHOTOMASKS, METHODS OF MANUFACTURING PHOTOMASKS, AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE USING PHOTOMASKS | Jun 25, 18 | Jun 13, 19 | Not available |
| 2019/0011,829 | PHOTOMASK AND METHOD FOR MANUFACTURING ACTIVE SWITCH ARRAY SUBSTRATE USING SAME | May 31, 17 | Jan 10, 19 | Not available |
| Upgrade to the Professional Level to view Top Owners for this Subclass.Learn More |
|---|
