G03F 1/48

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Description

Class  G03F : PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR


Subclass 1/48: Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof Protective coatings

Recent Patents

Patent #TitleFiling DateIssue DatePatent Owner
12235574 Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective maskJan 24, 24Feb 25, 25AGC Inc.
12222640 Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective maskOct 20, 23Feb 11, 25AGC Inc.
12204240 Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective maskDec 22, 23Jan 21, 25AGC Inc.
12197125 Mask and reticle protection with atomic layer deposition (ALD)Dec 22, 20Jan 14, 25Nano-Master, Inc.
12130548 Extreme ultraviolet mask with reduced wafer neighboring effectJun 28, 23Oct 29, 24TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
12124164 Reflective mask blank and reflective maskMar 29, 24Oct 22, 24AGC Inc.
12105411 Substrate with multilayer reflective film, reflective mask blank, reflective mask, and method for manufacturing semiconductor deviceAug 24, 20Oct 01, 24501 Hoya Corporation
12085856 Positive photosensitive resin composition, positive photosensitive dry film, method for producing positive photosensitive dry film, patterning process, method for forming cured film, interlayer insulation film, surface protective film, and electronic componentJul 30, 21Sep 10, 24Shin-Etsu Chemical Co. Ltd.
12066756 Method for lithography processJul 29, 22Aug 20, 24Taiwan Semiconductor Manufacturing Co., Ltd.
12055850 Fabricating method of photomask, photomask structure thereof, and semiconductor manufacturing method using the sameApr 09, 23Aug 06, 24Taiwan Semiconductor Manufacturing Company Ltd.
12038684 Reflective mask and fabricating method thereofMar 22, 23Jul 16, 24Taiwan Semiconductor Manufacturing Co., Ltd.
12019367 Mask blanks and methods for depositing layers on mask blankDec 19, 22Jun 25, 24TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
12001132 Protection layer on low thermal expansion material (LTEM) substrate of extreme ultraviolet (EUV) maskAug 07, 19Jun 04, 24TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
12001133 Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective maskOct 20, 23Jun 04, 24AGC Inc.
11977325 Photomask and its manufacturing methodMay 02, 21May 07, 24CHANGXIN MEMORY TECHNOLOGIES, INC.
11947261 Method for making photolithography mask plateJan 15, 21Apr 02, 24Tsinghua University; Hon Hai Precision Industry Co., Ltd;
11914284 Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective maskJul 03, 23Feb 27, 24AGC Inc.
11829065 Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective maskMar 31, 23Nov 28, 23AGC Inc.
11823903 Method for processing workpieceDec 22, 21Nov 21, 23Tokyo Electron Limited
11747730 Method for making photolithography mask plateJan 08, 21Sep 05, 23Tsinghua University; Hon Hai Precision Industry Co., Ltd;

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Recent Publications

Publication #TitleFiling DatePub DatePatent Owner
2025/0102,898 REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASKSep 04, 24Mar 27, 25Shin-Etsu Chemical Co., Ltd.
2025/0068,054 Mask and Reticle Protection with Atomic Layer Deposition (ALD)Nov 13, 24Feb 27, 25Not available
2025/0036,020 REFLECTIVE MASK BLANK, REFLECTIVE MASK BLANK MANUFACTURING METHOD, REFLECTIVE MASK, AND REFLECTIVE MASK MANUFACTURING METHODOct 09, 24Jan 30, 25AGC Inc.
2025/0004,360 REFLECTIVE MASK BLANK AND REFLECTIVE MASKSep 13, 24Jan 02, 25AGC Inc.
2024/0427,228 PHOTOMASK BLANK, PHOTOMASK, AND MANUFACTURING METHOD OF PHOTOMASKJun 12, 24Dec 26, 24Kioxia Corporation
2024/0393,678 REMOVING METHOD, REMOVAL APPARATUS, IMPRINT APPARATUS, REPLICA MANUFACTURING APPARATUS, AND ARTICLE MANUFACTURING METHODApr 18, 24Nov 28, 24Not available
2024/0377,719 SUBSTRATE WITH MULTILAYER REFLECTIVE FILM REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICESep 22, 22Nov 14, 24501 Hoya Corporation
2024/0357,791 PROCESS METHOD FOR IMPROVING SRAM OPERATING SPEEDMar 28, 24Oct 24, 24Shanghai Huali Integrated Circuit Corporation
2024/0288,763 REFLECTIVE PHOTOMASK AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASKJun 02, 22Aug 29, 24Not available
2024/0280,890 REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD OF MANUFACTURING REFLECTIVE MASKApr 29, 24Aug 22, 24AGC Inc.
2024/0241,455 ELECTRONIC DEVICEDec 14, 23Jul 18, 24Chimei Innolux Corporation
2024/0231,214 SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICEFeb 22, 22Jul 11, 24501 Hoya Corporation
2024/0231,219 HARD MASK AND SEMICONDUCTOR DEVICE COMPRISING THE SAMESep 19, 23Jul 11, 24Samsung Electronics Co., Ltd.
2024/0210,814 REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV LITHOGRAPHY, AND METHOD FOR MANUFACTURING SAMEMar 06, 24Jun 27, 24AGC INC.
2024/0184,193 MASK BLANK, REFLECTIVE MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICEMay 06, 22Jun 06, 24501 Hoya Corporation
2024/0176,226 METHOD FOR FABRICATING EUV MASK AND PHOTOMASK USING THE EUV MASKFeb 05, 24May 30, 24Not available
2024/0176,245 PHOTOLITHOGRAPHY PATTERNING METHODFeb 07, 24May 30, 24Not available
2024/0168,371 SELECTIVE HARDMASK ON HARDMASKFeb 07, 23May 23, 24Taiwan Semiconductor Manufacturing Company Ltd.
2024/0142,866 REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD FOR MANUFACTURING REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICEMar 25, 22May 02, 24501 Hoya Corporation
2024/0134,265 SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICEFeb 22, 22Apr 25, 24501 Hoya Corporation

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