G03F 1/42

Sub-Class

Watch 2Status Updates

Stats

Description

Class  G03F : PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR


Subclass 1/42: Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof Alignment or registration features, e.g. alignment marks on the mask substrates

Recent Patents

Patent #TitleFiling DateIssue DatePatent Owner
12243832 Method for manufacturing semiconductor device structure with overlay marksApr 08, 22Mar 04, 25NANYA TECHNOLOGY CORPORATION
12230585 Photolithography alignment process for bonded wafersJan 24, 24Feb 18, 25Taiwan Semiconductor Manufacturing Company Ltd.
12191297 Facilitating alignment of stacked chipletsJul 19, 22Jan 07, 25Tokyo Electron Limited
12170295 Photomask, display device, and manufacturing method thereofJan 25, 24Dec 17, 24Samsung Display Co., Ltd.
12154862 System and method for aligned stitchingMay 02, 23Nov 26, 24TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
12140859 Overlay target design for improved target placement accuracyApr 07, 22Nov 12, 24KLA Corporation
12140878 Processing system, processing method, measurement apparatus, substrate processing apparatus and article manufacturing methodJun 23, 23Nov 12, 24CANON KABUSHIKI KAISHA
12111568 Mask reticleOct 02, 21Oct 08, 24CHANGXIN MEMORY TECHNOLOGIES, INC.
12085852 Template, method of forming a template, apparatus and method of manufacturing an articleDec 27, 21Sep 10, 24CANON KABUSHIKI KAISHA
12085585 Particle image velocimetry of extreme ultraviolet lithography systemsMay 03, 23Sep 10, 24TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
12078922 Template, workpiece, and alignment methodSep 10, 21Sep 03, 24Kioxia Corporation
12055850 Fabricating method of photomask, photomask structure thereof, and semiconductor manufacturing method using the sameApr 09, 23Aug 06, 24Taiwan Semiconductor Manufacturing Company Ltd.
12055860 Multi-function overlay marks for reducing noise and extracting focus and critical dimension informationAug 07, 23Aug 06, 24Taiwan Semiconductor Manufacturing Co., Ltd.
12050397 Mask, exposure method and touch panelMar 15, 21Jul 30, 24HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD; BOE Technology Group Co. Ltd.;
12044977 Multiple-mask multiple-exposure lithography and masksJul 26, 23Jul 23, 24Taiwan Semiconductor Manufacturing Co., Ltd.
12025911 Reflective structure, reflective mask blank, reflective mask and method of manufacturing semiconductor deviceMay 02, 23Jul 02, 24501 Hoya Corporation
12021040 Overlay mark forming Moire pattern, overlay measurement method using same, and manufacturing method of semiconductor device using sameMay 09, 23Jun 25, 24AUROS TECHNOLOGY, INC.
12007686 Etch processing system having reflective endpoint detectionMay 06, 21Jun 11, 24Applied Materials Inc.
12007691 Substrate measuring device and a method of using the sameJun 30, 22Jun 11, 24Taiwan Semiconductor Manufacturing Co., Ltd.
12002765 Marks for overlay measurement and overlay error correctionJan 04, 22Jun 04, 24NANYA TECHNOLOGY CORPORATION

more results

Recent Publications

Publication #TitleFiling DatePub DatePatent Owner
2025/0116,941 STITCHING METHOD FOR EXPOSURE PROCESSNov 14, 23Apr 10, 25Powerchip Semiconductor Manufacturing Corporation; AP Memory Technology Corporation;
2025/0096,146 PHOTOLITHOGRAPHY METHOD AND STRUCTURES THEREOFJan 24, 24Mar 20, 25Not available
2025/0060,660 LITHOGRAPHY MASK HAVING OVERLAY MARK AND RELATED METHODJan 03, 24Feb 20, 25Not available
2024/0411,221 PHOTOMASK SET, DESIGN METHOD THEREOF, AND MANUFACTURING METHOD OF PHOTORESIST PATTERNJul 03, 23Dec 12, 24United Microelectronics Corp.
2024/0411,223 METHOD FOR PROCESSING DC MARKS FOR REPAIRING LITHOGRAPHY MASKSJun 06, 24Dec 12, 24Not available
2024/0377,755 MULTIPLE-MASK MULTIPLE-EXPOSURE LITHOGRAPHY AND MASKSJul 22, 24Nov 14, 24Not available
2024/0369,919 PATTERNING DEVICE FOR A LITHOGRAPHIC APPARATUS AND METHODMar 09, 22Nov 07, 24ASML Netherlands B.V.
2024/0361,350 PARTICLE IMAGE VELOCIMETRY OF EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEMSJul 11, 24Oct 31, 24Taiwan Semiconductor Manufacturing Company Ltd.
2024/0345,470 MASK, EXPOSURE METHOD AND TOUCH PANELJun 25, 24Oct 17, 24Not available
2024/0310,722 METHODS AND APPARATUSES FOR PROCESSING A LITHOGRAPHIC OBJECTMay 20, 24Sep 19, 24Not available
2024/0241,451 METHOD OF MEASURING OVERLAY AND SEMICONDUCTOR DEVICE MANUFACTURED USING THE SAMEDec 05, 23Jul 18, 24Not available
2024/0219,848 EXTREME ULTRAVIOLET EXPOSURE APPARATUS INCLUDING A MASK STAGENov 27, 23Jul 04, 24Not available
2024/0203,796 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICENov 14, 23Jun 20, 24Not available
2024/0162,142 DIAGONAL VIA MANUFACTURING METHODJan 24, 24May 16, 24Not available
2024/0094,624 PATTERN FORMATION METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND IMPRINT APPARATUSAug 29, 23Mar 21, 24Not available
2024/0094,625 PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASKNov 29, 23Mar 21, 24Not available
2024/0085,776 PHOTOLITHOGRAPHY MASK AND PHOTOLITHOGRAPHY SYSTEM COMPRISING SAID PHOTOLITHOGRAPHY MASKMar 31, 22Mar 14, 24Not available
2024/0085,778 PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAMEMay 16, 23Mar 14, 24Not available
2024/0053,673 STRUCTURE AND METHOD OF SIGNAL ENHANCEMENT FOR ALIGNMENT PATTERNSAug 11, 22Feb 15, 24Not available
2024/0027,890 REFLECTIVE MASK AND METHOD OF DESIGNING ANTI-REFLECTION PATTERN OF THE SAMEMar 08, 23Jan 25, 24Not available

more results

Top Owners in This Subclass

Upgrade to the Professional Level to view Top Owners for this Subclass.Learn More

Patents Issued To Date - By Filing Year

Average Time to Issuance