G03F 1/40

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Description

Class  G03F : PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR


Subclass 1/40: Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate

Recent Patents

Patent #TitleFiling DateIssue DatePatent Owner
12124162 Substrate with film for reflective mask blank, reflective mask blank, and method for manufacturing reflective maskSep 12, 22Oct 22, 24Shin-Etsu Chemical Co. Ltd.
12038684 Reflective mask and fabricating method thereofMar 22, 23Jul 16, 24Taiwan Semiconductor Manufacturing Co., Ltd.
11982944 Method of lithography process and transferring a reticleMay 31, 23May 14, 24TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
11815801 Reflective type blankmask and photomask for EUVJan 08, 21Nov 14, 23S&S TECH CO., LTD.
11703763 Method of lithography process using reticle container with discharging deviceApr 29, 22Jul 18, 23Taiwan Semiconductor Manufacturing Company Ltd.
11630386 Reflective mask and fabricating method thereofJan 19, 22Apr 18, 23Taiwan Semiconductor Manufacturing Co., Ltd.
11493842 Photomask with electrostatic discharge protectionMar 04, 19Nov 08, 22Yangtze Memory Technologies Co., Ltd.
11320733 Reticle with conductive material structureOct 08, 20May 03, 22Taiwan Semiconductor Manufacturing Company Ltd.
11315882 Alignment mark, substrate and manufacturing method therefor, and exposure alignment methodSep 07, 18Apr 26, 22Ordos Yuansheng Optoelectronics Co., Ltd.; BOE Technology Group Co. Ltd.;
11243461 Reflective mask and fabricating method thereofOct 17, 19Feb 08, 22Taiwan Semiconductor Manufacturing Co., Ltd.
11163229 Induced stress for EUV pellicle tensioningNov 05, 19Nov 02, 21Interuniversitair Microelektronica Centrum (IMEC VZW); Katholieke Universiteit Leuven, KU LEUVEN R&D;
11036127 Reflective mask blank and reflective maskAug 07, 18Jun 15, 21AGC INC.
10996554 Substrate with an electrically conductive film, substrate with a multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing semiconductor deviceFeb 20, 20May 04, 21501 Hoya Corporation
10859902 Lithography mask and methodSep 11, 19Dec 08, 20Taiwan Semiconductor Manufacturing Company Ltd.
10802394 Method for discharging static charges on reticleJan 31, 18Oct 13, 20Taiwan Semiconductor Manufacturing Co., Ltd.
10719009 Photo mask and method of manufacturing semiconductor element using photo maskNov 08, 18Jul 21, 20Samsung Display Co., Ltd.
10712652 Mask blank having a resist layer, method for manufacturing mask blank having resist layer, and method for manufacturing transfer maskNov 07, 16Jul 14, 20501 Hoya Corporation
10606166 Substrate with electrically conductive film, substrate with multilayer reflective film, reflective mask blank, reflective mask, and method of manufacturing semiconductor deviceJun 08, 16Mar 31, 20501 Hoya Corporation
10488757 Conductive composition, antistatic film, laminate and production therefor, and production method for photomaskMay 13, 15Nov 26, 19Mitsubishi Chemical Corporation
10481483 Lithography mask and methodNov 17, 17Nov 19, 19Taiwan Semiconductor Manufacturing Company Ltd.

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Recent Publications

Publication #TitleFiling DatePub DatePatent Owner
2024/0347,552 METHOD FOR MANUFACTURING DRIVE CIRCUIT, DRIVE CIRCUIT AND PHOTOMASKDec 30, 21Oct 17, 24HKC Corporation Limited
2024/0264,521 METHOD FOR INVERSE OPTICAL PROXIMITY CORRECTION OF SUPER-RESOLUTION LITHOGRAPHY BASED ON LEVEL SET ALGORITHMDec 28, 21Aug 08, 24Not available
2023/0138,079 LITHOGRAPHY SYSTEMJun 30, 22May 04, 23Not available
2022/0397,820 PHOTOMASK, METHOD OF MANUFACTURING ARRAY SUBSTRATE, AND DISPLAY PANELDec 31, 20Dec 15, 22TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
2022/0146,924 REFLECTIVE MASK AND FABRICATING METHOD THEREOFJan 19, 22May 12, 22Taiwan Semiconductor Manufacturing Co., Ltd.
2021/0373,434 TRANSPORT COMPLEX AND TRANSPORT MODULE INCLUDING THE SAMEMar 01, 21Dec 02, 21Not available
2020/0371,426 ANTI-STATIC PHOTOMASKMay 22, 19Nov 26, 20Not available
2018/0335,693 MASK BLANK HAVING RESIST LAYER, METHOD FOR MANUFACTURING MASK BLANK HAVING RESIST LAYER, AND METHOD FOR MANUFACTURING TRANSFER MASKNov 07, 16Nov 22, 18501 Hoya Corporation

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