G03F 1/38

Sub-Class

Watch 3Status Updates

Stats

Description

Class  G03F : PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR


Subclass 1/38: Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof

Recent Patents

Patent #TitleFiling DateIssue DatePatent Owner
12252074 Vehicular camera module with micro-lens array at imagerApr 07, 23Mar 18, 25MAGNA ELECTRONICS INC.
12252773 Deposition mask and deposition apparatus including the sameOct 14, 21Mar 18, 25Samsung Display Co., Ltd.
12238882 Components of an electronic device and methods for their assemblyFeb 12, 24Feb 25, 25Apple Inc.
12230535 Method for fabricating semiconductor device with damascene structureMar 23, 22Feb 18, 25NANYA TECHNOLOGY CORPORATION
12222639 Extreme ultraviolet mask and method of manufacturing the sameJul 20, 23Feb 11, 25TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
12181791 Extreme ultraviolet mask and method of manufacturing the sameJul 24, 23Dec 31, 24TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
12169356 Mask plateApr 09, 21Dec 17, 24BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.; BOE Technology Group Co. Ltd.;
12142518 Method for fabricating semiconductor device with damascene structure by using etch stop layerMar 23, 22Nov 12, 24NANYA TECHNOLOGY CORPORATION
12135497 Random weight initialization of non-volatile memory arraySep 30, 21Nov 05, 24IBM Corporation
12135498 Device and method for enabling deriving of corrected digital pattern descriptionsSep 09, 21Nov 05, 24Mycronic AB
12137529 Components of an electronic device and methods for their assemblyMar 14, 23Nov 05, 24Apple Inc.
12130549 Method of manufacturing a templateSep 27, 21Oct 29, 24CANON KABUSHIKI KAISHA
12123983 Aligning sensors on vehicles using sensor outputApr 24, 19Oct 22, 24The Boeing Company
12124163 Mask defect preventionJul 27, 23Oct 22, 24Taiwan Semiconductor Manufacturing Co., Ltd.
12105411 Substrate with multilayer reflective film, reflective mask blank, reflective mask, and method for manufacturing semiconductor deviceAug 24, 20Oct 01, 24501 Hoya Corporation
12044933 Photopatterning of molecular orientationsAug 08, 16Jul 23, 24Not available
12044977 Multiple-mask multiple-exposure lithography and masksJul 26, 23Jul 23, 24Taiwan Semiconductor Manufacturing Co., Ltd.
12013642 Pellicle for flat panel display photomaskNov 21, 22Jun 18, 24Photronics Inc.
12001149 Component for use in a lithographic apparatus, method of protecting a component and method of protecting tables in a lithographic apparatusJan 24, 20Jun 04, 24ASML Netherlands B.V.
11982944 Method of lithography process and transferring a reticleMay 31, 23May 14, 24TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

more results

Recent Publications

Publication #TitleFiling DatePub DatePatent Owner
2025/0102,900 RELEASABLE FLEXOGRAPHIC PRINTING MASK WITH LASER THERMAL IMAGING FILM CONTAINING LECITHINSep 26, 23Mar 27, 25MIRACLON CORPORATION
2025/0102,901 CONTACTS FOR REDUCING WEAR IN A RETICLE CONTAINERSep 20, 24Mar 27, 25Not available
2025/0093,764 EXTREME ULTRAVIOLET MASKNov 27, 24Mar 20, 25Taiwan Semiconductor Manufacturing Company Ltd.
2025/0060,672 PHOTOLITHOGRAPHY METHOD USING CASTELLATION SHAPED ASSIST FEATURES TO FORM A LINE-AND-SPACE PATTERN AND PHOTOMASK CONTAINING THE ASSIST FEATURESAug 17, 23Feb 20, 25Not available
2025/0029,871 METHOD FOR FABRICATING SEMICONDUCTOR DEVICE WITH DAMASCENE STRUCTURE BY USING ETCH STOP LAYEROct 08, 24Jan 23, 25Not available
2024/0427,232 METHODS AND APPARATUS TO PHOTOLITHOGRAPHICALLY PATTERN MATERIALS IN INTEGRATED CIRCUIT PACKAGESJun 26, 23Dec 26, 24Not available
2024/0431,057 COMPONENTS OF AN ELECTRONIC DEVICE AND METHODS FOR THEIR ASSEMBLYSep 11, 24Dec 26, 24Not available
2024/0402,612 MASK, LITHOGRAPHING APPARATUS, METHOD OF MANUFACTURING MASK AND LITHOGRAPHING METHOD BASED ON MASKOct 19, 22Dec 05, 24Not available
2024/0385,507 MASK DEFECT PREVENTIONJul 29, 24Nov 21, 24Not available
2024/0385,505 DRY PHOTORESIST OR HARDMASK FOR EUV LITHOGRAPHYMay 18, 23Nov 21, 24Not available
2024/0377,755 MULTIPLE-MASK MULTIPLE-EXPOSURE LITHOGRAPHY AND MASKSJul 22, 24Nov 14, 24Not available
2024/0342,749 MASK AND MANUFACTURING METHOD THEREOFOct 25, 23Oct 17, 24Not available
2024/0345,469 PHOTOMASK STRUCTUREApr 27, 23Oct 17, 24United Microelectronics Corp.
2024/0319,408 ANTI-SCATTERING AND ANTI-INTERFERENCE COATING PATTERN STRUCTURE OF AN OPTICAL FILMMar 22, 23Sep 26, 24Not available
2024/0319,582 Optical Component with Apodized MaskMar 08, 24Sep 26, 24Not available
2024/0319,583 ORIGINAL, METHOD OF DETERMINING PATTERN OF ORIGINAL, AND METHOD OF EXPOSINGMar 15, 24Sep 26, 24Not available
2024/0280,908 PELLICLE FOR FLAT PANEL DISPLAY PHOTOMASKApr 29, 24Aug 22, 24Not available
2024/0258,114 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOFApr 10, 24Aug 01, 24Taiwan Semiconductor Manufacturing Company Ltd.
2024/0248,389 APPARATUS FOR FABRICATING BLANK MASK AND METHOD OF FABRICATING THE SAMEJan 15, 24Jul 25, 24Not available
2024/0240,303 METAL MASK STRUCTURE, PHOTOMASK FOR PREPARING SHIELDING LAYER, AND METHOD FOR PREPARING METAL MASK STRUCTURE BY USING PHOTOMASKJan 03, 24Jul 18, 24Not available

more results

Top Owners in This Subclass

Upgrade to the Professional Level to view Top Owners for this Subclass.Learn More

Patents Issued To Date - By Filing Year

Average Time to Issuance