G03F 1/36

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Description

Class  G03F : PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR


Subclass 1/36: Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes

Recent Patents

Patent #TitleFiling DateIssue DatePatent Owner
12265325 Inverse lithography and machine learning for mask synthesisJul 31, 23Apr 01, 25Synopsys, Inc.
12265334 Optical proximity correction and photomasksJul 30, 23Apr 01, 25Taiwan Semiconductor Manufacturing Co., Ltd.
12248242 Methods and systems for reticle enhancement technology of a design pattern to be manufactured on a substrateMar 11, 24Mar 11, 25D2S, Inc.
12242183 Enforcing mask synthesis consistency across random areas of integrated circuit chipsApr 03, 24Mar 04, 25Synopsys, Inc.
12243712 Method and system for determining a charged particle beam exposure for a local pattern densityAug 03, 23Mar 04, 25D2S, Inc.
12229488 Phase shifter circuit, phase shifter layout and method of forming the sameJun 06, 22Feb 18, 25TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
12230584 Method for manufacturing semiconductor mark, and semiconductor markJan 25, 22Feb 18, 25CHANGXIN MEMORY TECHNOLOGIES, INC.
12216979 Method for correcting mask pattern, apparatus for correcting mask pattern and method for manufacturing semiconductor deviceJan 11, 22Feb 04, 25CHANGXIN MEMORY TECHNOLOGIES, INC.
12210290 Optical proximity correction method and method of fabricating a semiconductor device using the sameOct 08, 21Jan 28, 25Samsung Electronics Co. Ltd.
12204241 Optical proximity correction method and mask manufacturing method of lithography systemAug 31, 21Jan 21, 25Samsung Electronics Co. Ltd.
12206002 Semiconductor device with deep trench isolation mask layoutDec 23, 21Jan 21, 25SK keyfoundry Inc.
12197122 Compensation method and system for exposure alignmentNov 09, 21Jan 14, 25CHANGXIN MEMORY TECHNOLOGIES, INC.
12197123 Methods for making semiconductor-based integrated circuitsOct 20, 23Jan 14, 25Taiwan Semiconductor Manufacturing Company Ltd.
12201037 Cluster tool for production-worthy fabrication of Dolan bridge quantum Josephson junction devicesNov 06, 19Jan 14, 25IBM Corporation
12181792 Optical proximity correction method and method of manufacturing extreme ultraviolet mask by using the sameFeb 18, 22Dec 31, 24Samsung Electronics Co. Ltd.
12181793 Mask synthesis using tensor-based computing platformsMar 29, 21Dec 31, 24Synopsys, Inc.
12169679 Transmission gate structureJul 31, 23Dec 17, 24TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
12153350 Method of manufacturing semiconductor devicesJul 19, 23Nov 26, 24TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
12147156 Method of fabricating a semiconductor layout and a semiconductor structureDec 20, 21Nov 19, 24Fujian Jinhua Integrated Circuit Co., Ltd.
12147155 Mask correction method, mask correction device for double patterning and training method for layout machine learning modelJun 28, 21Nov 19, 24United Microelectronics Corp.

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Recent Publications

Publication #TitleFiling DatePub DatePatent Owner
2025/0102,899 MASK OPTIMIZATION PREFERENTIALLY ACCOUNTING FOR OVERLAP REGIONSAug 23, 24Mar 27, 25Not available
2025/0093,765 METHODS FOR MAKING SEMICONDUCTOR-BASED INTEGRATED CIRCUITSDec 05, 24Mar 20, 25Not available
2025/0076,749 OPC METHOD AND MASK MANUFACTURING METHOD INCLUDING OPC METHODApr 25, 24Mar 06, 25Samsung Electronics Co. Ltd.
2025/0068,051 MASK OPTIMIZATION FOR FIRST LAYER THAT ACCOUNTS FOR OTHER LAYERSAug 23, 24Feb 27, 25Not available
2025/0068,052 MASK OPTIMIZATION FOR LAYER BASED ON COMPARISON OF COMPONENTS IN LAYER TO COMPONENTS IN OTHER LAYERSAug 23, 24Feb 27, 25Not available
2025/0068,053 MASK OPTIMIZATION ACCOUNTING FOR MORE CRITICAL AND LESS CRITICAL OVERLAP REGIONSAug 23, 24Feb 27, 25Not available
2025/0044,678 METHOD AND NON-TRANSITORY COMPUTER-READABLE MEDIUM FOR GENERATING LAYOUT BASED ON PATH LABELED WITH MARKERAug 04, 23Feb 06, 25Not available
2025/0044,708 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICESOct 18, 24Feb 06, 25Taiwan Semiconductor Manufacturing Company Ltd.
2025/0048,712 SEMICONDUCTOR DEVICE WITH DEEP TRENCH ISOLATION MASK LAYOUTOct 23, 24Feb 06, 25SK keyfoundry Inc.
2025/0036,022 OPTICAL PROXIMITY CORRECTION (OPC) METHOD AND MASK MANUFACTURING METHOD COMPRISING OPC METHODApr 11, 24Jan 30, 25Not available
2025/0028,235 OPTICAL PROXIMITY CORRECTION METHODS AND MASK MANUFACTURING METHODS INCLUDING THE OPTICAL PROXIMITY CORRECTION METHODSApr 23, 24Jan 23, 25Not available
2025/0020,993 PHOTOMASK AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICEOct 01, 24Jan 16, 25Powerchip Semiconductor Manufacturing Corporation
2025/0021,015 DETERMINING AN ETCH EFFECT BASED ON AN ETCH BIAS DIRECTIONOct 26, 22Jan 16, 25ASML NETHERLANDS B.V.
2025/0004,361 OPTICAL PROXIMITY CORRECTION METHOD AND SEMICONDUCTOR FABRICATION METHOD USING THE SAMEFeb 09, 24Jan 02, 25Not available
2024/0427,229 MANUFACTURING METHOD FOR PHOTOMASK, AND PHOTOMASKJun 05, 24Dec 26, 24Not available
2024/0427,230 METHOD OF FORMING PHOTOMASK, LAYOUT PATTERN AND SYSTEM FOR PATTERNING SEMICONDUCTOR SUBSTRATE BY USING PHOTOMASKOct 17, 23Dec 26, 24Fujian Jinhua Integrated Circuit Co., Ltd.
2024/0427,231 OPTICAL PROXIMITY CORRECTION METHOD AND MASK MANUFACTURING METHOD BY USING THE SAMEJan 19, 24Dec 26, 24Samsung Electronics Co., Ltd.
2024/0419,084 OPTICAL PROXIMITY CORRECTION METHOD AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAMEFeb 15, 24Dec 19, 24Not available
2024/0413,024 PATTERN INSPECTION DEVICE AND PATTERN INSPECTION METHODDec 07, 23Dec 12, 24Samsung Electronics Co., Ltd.
2024/0402,587 METHOD FOR FABRICATING MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAMEMar 13, 24Dec 05, 24Not available

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Patents Issued To Date - By Filing Year

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