G03F 1/34

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Description

Class  G03F : PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR


Subclass 1/34: Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Phase shift masks [PSM]; PSM blanks; Preparation thereof Phase-edge PSM, e.g. chromeless PSM; Preparation thereof

Recent Patents

Patent #TitleFiling DateIssue DatePatent Owner
11372323 Phase-shift mask for extreme ultraviolet lithographyMar 10, 20Jun 28, 22Samsung Electronics Co. Ltd.
11314161 Mask blank, phase shift mask, and method of manufacturing semiconductor deviceFeb 20, 19Apr 26, 22501 Hoya Corporation
11022874 Chromeless phase shift mask structure and processAug 22, 19Jun 01, 21Taiwan Semiconductor Manufacturing Co., Ltd.
10509310 Patterning devices for use within a lithographic apparatus, methods of making and using such patterning devicesMar 08, 16Dec 17, 19ASML Netherlands B.V.
10394114 Chromeless phase shift mask structure and processMay 17, 17Aug 27, 19Taiwan Semiconductor Manufacturing Co., Ltd.
9885950 Phase shift mask, method for manufacturing the same, and method for forming micro patternApr 20, 15Feb 06, 18SAMSUNG DISPLAY CO., LTD.
9465296 Nanopatterning method and apparatusJul 11, 12Oct 11, 16METAMATERIAL TECHNOLOGIES USA, INC.
9201311 Methods and patterning devices for measuring phase aberrationJun 26, 12Dec 01, 15ASML NETHERLANDS B.V.
8685597 Forming a bridging feature using chromeless phase-shift lithographyOct 07, 11Apr 01, 14SEAGATE TECHNOLOGY LLC
8603706 Forming a bridging feature using chromeless phase-shift lithographyOct 07, 11Dec 10, 13SEAGATE TECHNOLOGY LLC
8563199 Forming a bridging feature using chromeless phase-shift lithographyOct 07, 11Oct 22, 13SEAGATE TECHNOLOGY LLC
8389183 Chromeless phase-shifting photomask with undercut rim-shifting elementFeb 09, 10Mar 05, 13GLOBALFOUNDRIES INC.

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Recent Publications

Publication #TitleFiling DatePub DatePatent Owner
2024/0337,919 MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICEJun 30, 22Oct 10, 24501 Hoya Corporation
2022/0035,235 MASK BLANK, TRANSFER MASK, AND SEMICONDUCTOR-DEVICE MANUFACTURING METHODSep 10, 19Feb 03, 22501 Hoya Corporation

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Top Owners in This Subclass

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Patents Issued To Date - By Filing Year

Average Time to Issuance