G03F 1/28

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Description

Class  G03F : PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR


Subclass 1/28: Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Phase shift masks [PSM]; PSM blanks; Preparation thereof with three or more diverse phases on the same PSM; Preparation thereof

Recent Patents

Patent #TitleFiling DateIssue DatePatent Owner
10852634 Phase shifter maskJul 08, 19Dec 01, 20TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
10634990 Photomask and methods for manufacturing and correcting photomaskJul 11, 19Apr 28, 20Dai Nippon Printing Co Ltd.
10394118 Photomask and methods for manufacturing and correcting photomaskJul 12, 18Aug 27, 19Dai Nippon Printing Co Ltd.
10345692 Photomask and a fabrication method thereforJan 05, 17Jul 09, 19TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
10338464 Photomask including transfer patterns for reducing a thermal stressNov 14, 17Jul 02, 19SK hynix, Inc.
10048580 Photomask and methods for manufacturing and correcting photomaskNov 02, 16Aug 14, 18DAI NIPPON PRINTING CO., LTD.
9881808 Mask and pattern forming methodDec 28, 15Jan 30, 18TOSHIBA MEMORY CORPORATION
9846358 Photomask including transfer patterns for reducing a thermal stressNov 04, 15Dec 19, 17SK HYNIX INC.
9778559 Method for preparing halftone phase shift photomask blankMar 23, 16Oct 03, 17SHIN-ETSU CHEMICAL CO., LTD.
9658531 Semiconductor device resolution enhancement by etching multiple sides of a maskSep 03, 14May 23, 17GLOBALFOUNDRIES INC.
9529249 Extreme ultraviolet lithography process and maskJul 15, 14Dec 27, 16TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
9507252 Photomask and pattern forming method using photomaskJul 14, 15Nov 29, 16PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
9470972 Mask for photolithography, method for fabricating the same and method for manufacturing semiconductor device using the maskMar 09, 15Oct 18, 16SAMSUNG ELECTRONICS CO., LTD.
9177990 Method for forming impurity layer, exposure mask therefore and method for producing solid-state imaging deviceSep 06, 11Nov 03, 15KABUSHIKI KAISHA TOSHIBA
8904316 Method and apparatus for printing high-resolution two-dimensional periodic patternsNov 16, 11Dec 02, 14Eulitha AG
8389183 Chromeless phase-shifting photomask with undercut rim-shifting elementFeb 09, 10Mar 05, 13GLOBALFOUNDRIES INC.

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Patents Issued To Date - By Filing Year

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