G03F 1/24

Sub-Class

Watch 11Status Updates

Stats

Description

Class  G03F : PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR


Subclass 1/24: Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Masks or mask blanks for imaging by radiation of 100 nm or shorter wavelength, e.g. X-ray masks, extreme ultra-violet [EUV] masks; Preparation thereof Reflection masks; Preparation thereof

Recent Patents

Patent #TitleFiling DateIssue DatePatent Owner
12265321 Reflective mask blank, and method for manufacturing reflective maskMay 31, 22Apr 01, 25Shin-Etsu Chemical Co. Ltd.
12265322 EUV mask blank and method of making EUV mask blankAug 04, 23Apr 01, 25Taiwan Semiconductor Manufacturing Co., Ltd.
12265323 Pellicle for an EUV lithography mask and a method of manufacturing thereofNov 21, 23Apr 01, 25TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
12259647 Method of manufacturing extreme ultraviolet (EUV) photomask and method and apparatus for correcting EUV photomaskJul 09, 21Mar 25, 25Samsung Electronics Co. Ltd.
12253796 Extreme ultraviolet mask and method for forming the sameDec 19, 23Mar 18, 25Taiwan Semiconductor Manufacturing Co., Ltd.
12235573 EUV photomask and manufacturing method of the sameJul 30, 23Feb 25, 25Taiwan Semiconductor Manufacturing Company Ltd.
12235574 Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective maskJan 24, 24Feb 25, 25AGC Inc.
12235575 Reflective mask blank for EUV lithography and substrate with conductive filmFeb 12, 24Feb 25, 25AGC INC.
12228852 Reflective mask blank, reflective mask and method for manufacturing a semiconductor deviceDec 04, 23Feb 18, 25501 Hoya Corporation
12228853 Reflective mask blank, reflective mask, and manufacturing methodAug 29, 24Feb 18, 25AGC INC.
12222639 Extreme ultraviolet mask and method of manufacturing the sameJul 20, 23Feb 11, 25TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
12222640 Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective maskOct 20, 23Feb 11, 25AGC Inc.
12216397 Reflective mask blank for EUV lithography, mask blank for EUV lithography, and manufacturing methods thereofOct 17, 23Feb 04, 25AGC Inc.
12216398 Reflective mask blank and reflective maskJan 19, 24Feb 04, 25AGC INC.
12210279 Electroconductive-film-coated substrate and reflective mask blankMay 24, 22Jan 28, 25AGC Inc.
12210280 EUV photo masks and manufacturing method thereofJan 02, 24Jan 28, 25TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
12204240 Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective maskDec 22, 23Jan 21, 25AGC Inc.
12197120 Patterning device and method of use thereofJan 02, 20Jan 14, 25ASML NETHERLANDS B.V.
12197125 Mask and reticle protection with atomic layer deposition (ALD)Dec 22, 20Jan 14, 25Nano-Master, Inc.
12181790 Reflective mask blank and reflective maskFeb 11, 22Dec 31, 24Shin-Etsu Chemical Co. Ltd.

more results

Recent Publications

Publication #TitleFiling DatePub DatePatent Owner
2025/0116,920 ELECTROCONDUCTIVE-FILM-COATED SUBSTRATE AND REFLECTIVE MASK BLANKDec 16, 24Apr 10, 25AGC Inc.
2025/0102,898 REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASKSep 04, 24Mar 27, 25Shin-Etsu Chemical Co., Ltd.
2025/0093,762 EUV LITHOGRAPHY MASKS AND METHODSFeb 06, 24Mar 20, 25Not available
2025/0093,763 PHOTOMASK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAMEAug 29, 24Mar 20, 25Not available
2025/0093,764 EXTREME ULTRAVIOLET MASKNov 27, 24Mar 20, 25Taiwan Semiconductor Manufacturing Company Ltd.
2025/0085,622 Extreme Ultraviolet (EUV) Mask and Method of Fabrication ThereofJan 18, 24Mar 13, 25Not available
2025/0076,748 REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE EQUIPPED WITH CONDUCTIVE FILMNov 15, 24Mar 06, 25AGC Inc.
2025/0068,050 PHOTOMASK ASSEMBLY AND SEMICONDUCTOR CHIP MANUFACTURED USING THE SAMEMay 30, 24Feb 27, 25Not available
2025/0068,054 Mask and Reticle Protection with Atomic Layer Deposition (ALD)Nov 13, 24Feb 27, 25Not available
2025/0060,658 REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASKAug 02, 24Feb 20, 25Shin-Etsu Chemical Co., Ltd.
2025/0060,659 REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASKAug 02, 24Feb 20, 25Shin-Etsu Chemical Co., Ltd.
2025/0053,076 EXTREME ULTRAVIOLET LIGHT REFLECTIVE STRUCTURE INCLUDING NANO-LATTICE AND MANUFACTURING METHOD THEREOFOct 30, 24Feb 13, 25Taiwan Semiconductor Manufacturing Company Ltd.
2025/0044,679 PUPIL FILTER WITH SPATIALLY-VARYING TRANSMISSIONJul 31, 23Feb 06, 25Not available
2025/0036,019 EUV RETICLE WITH EMBEDDED PROCESS ASSISTANCE LAYER AND METHOD OF MANUFACTURING THE EUV RETICLEJul 28, 23Jan 30, 25Not available
2025/0036,020 REFLECTIVE MASK BLANK, REFLECTIVE MASK BLANK MANUFACTURING METHOD, REFLECTIVE MASK, AND REFLECTIVE MASK MANUFACTURING METHODOct 09, 24Jan 30, 25AGC Inc.
2025/0004,360 REFLECTIVE MASK BLANK AND REFLECTIVE MASKSep 13, 24Jan 02, 25AGC Inc.
2025/0004,362 PELLICLE MEMBRANEJul 28, 22Jan 02, 25ASML NETHERLANDS B.V.
2024/0427,226 REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND MANUFACTURING METHOD THEREFORSep 03, 24Dec 26, 24AGC Inc.
2024/0427,227 REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD OF MANUFACTURING REFLECTIVE MASKSep 03, 24Dec 26, 24AGC Inc.
2024/0411,219 REFLECTIVE PHOTOMASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASKMay 28, 24Dec 12, 24Shin-Etsu Chemical Co., Ltd.

more results

Top Owners in This Subclass

Upgrade to the Professional Level to view Top Owners for this Subclass.Learn More

Patents Issued To Date - By Filing Year

Average Time to Issuance