G03F 1/22

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Description

Class  G03F : PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR


Subclass 1/22: Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Masks or mask blanks for imaging by radiation of 100 nm or shorter wavelength, e.g. X-ray masks, extreme ultra-violet [EUV] masks; Preparation thereof

Recent Patents

Patent #TitleFiling DateIssue DatePatent Owner
12242181 Photomask assembly and method of forming the sameJul 31, 23Mar 04, 25Taiwan Semiconductor Manufacturing Company Ltd.
12222639 Extreme ultraviolet mask and method of manufacturing the sameJul 20, 23Feb 11, 25TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
12209046 Glass substrate for EUVL, manufacturing method thereof, mask blank for EUVL, and manufacturing method thereofApr 30, 21Jan 28, 25AGC Inc.
12189284 Method for forming semiconductor deviceJul 09, 21Jan 07, 25TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
12181791 Extreme ultraviolet mask and method of manufacturing the sameJul 24, 23Dec 31, 24TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
12174527 Pellicle for an EUV lithography mask and a method of manufacturing thereofJul 25, 23Dec 24, 24TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
12153350 Method of manufacturing semiconductor devicesJul 19, 23Nov 26, 24TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
12140857 Method of fast surface particle and scratch detection for EUV mask backsideJul 24, 23Nov 12, 24TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
12135499 Reticle enclosure for lithography systemsAug 30, 21Nov 05, 24TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
12130548 Extreme ultraviolet mask with reduced wafer neighboring effectJun 28, 23Oct 29, 24TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
12085843 Method of manufacturing EUV photo masksJul 25, 23Sep 10, 24TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
12085844 Ultra-thin, ultra-low density films for EUV lithographyAug 07, 23Sep 10, 24LINTEC OF AMERICA, INC.
12085866 Particle removing assembly and method of cleaning mask for lithographyMay 23, 23Sep 10, 24TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
12066756 Method for lithography processJul 29, 22Aug 20, 24Taiwan Semiconductor Manufacturing Co., Ltd.
12066757 Mask and method of forming the sameApr 27, 23Aug 20, 24Taiwan Semiconductor Manufacturing Company Ltd.
12066758 Pellicle and pellicle assemblyApr 25, 22Aug 20, 24ASML NETHERLANDS B.V.; ASML Holding N.V;
12060317 Onium salt, chemically amplified negative resist composition, and pattern forming processMay 27, 21Aug 13, 24Shin-Etsu Chemical Co. Ltd.
12055860 Multi-function overlay marks for reducing noise and extracting focus and critical dimension informationAug 07, 23Aug 06, 24Taiwan Semiconductor Manufacturing Co., Ltd.
12025922 Methods and apparatus for reducing hydrogen permeation from lithographic toolJan 23, 23Jul 02, 24TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
12020906 Grounding cap module and gas injection deviceDec 13, 22Jun 25, 24Taiwan Semiconductor Manufacturing Company Ltd.

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Recent Publications

Publication #TitleFiling DatePub DatePatent Owner
2025/0102,903 EUV MASK AND PELLICLE ASSEMBLYSep 27, 23Mar 27, 25Not available
2025/0102,919 DIFFERENTIAL EVACUATION DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHODAug 16, 24Mar 27, 25Gigaphoton Inc.
2025/0093,764 EXTREME ULTRAVIOLET MASKNov 27, 24Mar 20, 25Taiwan Semiconductor Manufacturing Company Ltd.
2025/0076,752 PELLICLE FOR EUV LITHOGRAPHY MASKNov 15, 24Mar 06, 25Taiwan Semiconductor Manufacturing Company Ltd.
2025/0044,680 MASK INSPECTION DEVICE FOR PHOTOMASKS OF EUV LITHOGRAPHY AND CARRIER ELEMENT FOR USE IN A MASK INSPECTION DEVICEJul 17, 24Feb 06, 25Not available
2025/0044,708 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICESOct 18, 24Feb 06, 25Taiwan Semiconductor Manufacturing Company Ltd.
2025/0028,234 PELLICLE FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND METHOD FOR MANUFACTURING SAMENov 25, 22Jan 23, 25INFOVION INC.
2025/0004,387 CONTROLLING ELECTROSTATIC CHARGE ON MASKS FOR EXTREME ULTRAVIOLET LITHOGRAPHYJun 28, 23Jan 02, 25Not available
2024/0419,062 ULTRA-THIN, ULTRA-LOW DENSITY FILMS FOR EUV LITHOGRAPHYAug 27, 24Dec 19, 24LINTEC OF AMERICA, INC.
2024/0402,613 METHOD FOR SIMULATING ILLUMINATION AND IMAGING PROPERTIES OF AN OPTICAL PRODUCTION SYSTEM WHEN ILLUMINATING AND IMAGING AN OBJECT BY MEANS OF AN OPTICAL MEASUREMENT SYSTEMMay 31, 24Dec 05, 24Not available
2024/0393,673 METHOD OF FAST SURFACE PARTICLE AND SCRATCH DETECTION FOR EUV MASK BACKSIDEJul 31, 24Nov 28, 24Taiwan Semiconductor Manufacturing Company Ltd.
2024/0393,677 METHOD FOR FORMING SEMICONDUCTOR DEVICEJul 31, 24Nov 28, 24TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
2024/0393,699 MASK BLANK SUBSTRATE AND MANUFACTURING METHOD THEREOFMay 23, 24Nov 28, 24Shin-Etsu Chemical Co., Ltd.
2024/0385,505 DRY PHOTORESIST OR HARDMASK FOR EUV LITHOGRAPHYMay 18, 23Nov 21, 24Not available
2024/0385,511 RETICLE ENCLOSURE FOR LITHOGRAPHY SYSTEMSJul 29, 24Nov 21, 24Taiwan Semiconductor Manufacturing Company Ltd.
2024/0377,722 MASK AND METHOD OF FORMING THE SAMEJul 22, 24Nov 14, 24Taiwan Semiconductor Manufacturing Company Ltd.
2024/0377,741 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESSApr 30, 24Nov 14, 24Shin-Etsu Chemical Co., Ltd.
2024/0369,918 METHOD OF MANUFACTURING EUV PHOTO MASKSJul 12, 24Nov 07, 24Taiwan Semiconductor Manufacturing Company Ltd.
2024/0369,919 PATTERNING DEVICE FOR A LITHOGRAPHIC APPARATUS AND METHODMar 09, 22Nov 07, 24ASML Netherlands B.V.
2024/0369,921 RETICLE ENCLOSURE FOR LITHOGRAPHY SYSTEMSJul 18, 24Nov 07, 24Taiwan Semiconductor Manufacturing Company Ltd.

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