G03F 1/50

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Class  G03F : PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR


Subclass 1/50: Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Mask blanks not covered by groups G03F 1/2-G03F 1/26 ; Preparation thereof

Recent Patents

Patent #TitleFiling DateIssue DatePatent Owner
12174398 Method for forming micro-lens array and photomask thereforApr 12, 21Dec 24, 24VisEra Technologies Company Limited
12013631 Mask blank, transfer mask, and method for manufacturing semiconductor deviceDec 02, 22Jun 18, 24501 Hoya Corporation
11947255 Method for making photolithography mask plateJan 15, 21Apr 02, 24Tsinghua University; Hon Hai Precision Industry Co., Ltd;
11947261 Method for making photolithography mask plateJan 15, 21Apr 02, 24Tsinghua University; Hon Hai Precision Industry Co., Ltd;
11940737 Method of fabricating reticleMay 07, 21Mar 26, 24Taiwan Semiconductor Manufacturing Co., Ltd.
11807947 Methods for producing an etch resist pattern on a metallic surfaceJan 12, 22Nov 07, 23Kateeva, Inc.
11764062 Method of forming semiconductor structureOct 30, 18Sep 19, 23Taiwan Semiconductor Manufacturing Company Ltd.
11747730 Method for making photolithography mask plateJan 08, 21Sep 05, 23Tsinghua University; Hon Hai Precision Industry Co., Ltd;
11680133 Material for forming organic film, patterning process, and polymerOct 30, 20Jun 20, 23Shin-Etsu Chemical Co. Ltd.
11624979 Mask blank, transfer mask, and method of manufacturing semiconductor deviceMar 18, 22Apr 11, 23501 Hoya Corporation
11567411 Maskless photolithography devices, methods, and systemsMar 27, 19Jan 31, 23NanoPath, Inc.
11555783 Method for detecting particles on the surface of an object, wafer, and mask blankSep 27, 19Jan 17, 23Carl Zeiss SMT GmbH
11543744 Mask blank, transfer mask, and method for manufacturing semiconductor deviceAug 09, 21Jan 03, 23501 Hoya Corporation
11461532 Three-dimensional mask model for photolithography simulationNov 13, 20Oct 04, 22ASML NETHERLANDS B.V.
11429023 Onium salt, negative resist composition, and resist pattern forming processOct 17, 19Aug 30, 22Shin-Etsu Chemical Co. Ltd.
11366381 Mask structure and manufacturing method thereofApr 26, 19Jun 21, 22Unimicron Technology Corp.
11314162 Mask blank, transfer mask, and method of manufacturing semiconductor deviceFeb 28, 18Apr 26, 22501 Hoya Corporation
11294286 Pattern formation method using a photo mask for manufacturing a semiconductor deviceFeb 27, 19Apr 05, 22Taiwan Semiconductor Manufacturing Co., Ltd.
11255018 Methods for producing an etch resist pattern on a metallic surfaceSep 24, 20Feb 22, 22KATEEVA, LTD.
11214051 Method and apparatus for preparing a screen printing screenMar 21, 19Jan 04, 22M&R Printing Equipment, Inc.

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Recent Publications

Publication #TitleFiling DatePub DatePatent Owner
2025/0053,077 MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICENov 25, 22Feb 13, 25501 Hoya Corporation
2025/0028,236 HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNSMay 30, 24Jan 23, 25Not available
2024/0365,469 METHOD FOR PRODUCING FLEXIBLE PRINTED WIRING BOARDApr 22, 22Oct 31, 24FUJIKURA PRINTED CIRCUITS LTD.
2024/0264,521 METHOD FOR INVERSE OPTICAL PROXIMITY CORRECTION OF SUPER-RESOLUTION LITHOGRAPHY BASED ON LEVEL SET ALGORITHMDec 28, 21Aug 08, 24Not available
2024/0218,547 METAL STRUCTURE AND METHOD FOR MANUFACTURING SAMEMay 03, 22Jul 04, 24POINT ENGINEERING CO., LTD.
2024/0192,584 BLANK MASK AND PHOTOMASK USING THE SAMEDec 13, 22Jun 13, 24SK enpulse Co., Ltd.
2024/0192,600 MANUFACTURING METHOD OF METAL MASK AND METAL MASK THEREOFMay 18, 23Jun 13, 24Not available
2024/0060,168 METHOD OF MANUFACTURING MASK, MASK AND METHOD OF MANUFACTURING MASK APPARATUSJun 22, 23Feb 22, 24Dai Nippon Printing Co Ltd.
2024/0035,167 METHODS FOR PRODUCING AN ETCH RESIST PATTERN ON A METALLIC SURFACEOct 10, 23Feb 01, 24Kateeva, Inc.
2023/0083,755 BLANK MASK AND PHOTOMASK USING THE SAMEAug 30, 22Mar 16, 23SKC solmics Co., Ltd.
2022/0350,237 PHOTOMASK BLANK AND PHOTOMASK USING THE SAMEApr 26, 22Nov 03, 22SKC solmics Co., Ltd.
2022/0206,382 PATTERN FORMATION METHOD AND TEMPLATE MANUFACTURING METHODAug 31, 21Jun 30, 22Not available
2022/0050,375 OVERLAY PATTERNAug 18, 21Feb 17, 22Not available
2021/0132,500 METHOD FOR MAKING PHOTOLITHOGRAPHY MASK PLATEJan 15, 21May 06, 21Not available
2020/0166,833 MASK BLANK, METHOD OF MANUFACTURING TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICEMay 15, 18May 28, 20Hoya Corporation; HOYA ELECTRONICS SINGAPORE PTE. LTD.;
2020/0142,296 METHOD FOR MAKING MICROSTRUCTURES AND PHOTOLITHOGRAPHY MASK PLATEJan 06, 20May 07, 20Not available
2020/0019,053 BLANKMASK AND PHOTOMASK, AND METHODS OF FABRICATING THE SAMEDec 07, 18Jan 16, 20S&S TECH CO., LTD.
2019/0243,233 Photolithography Device for Generating Pattern on a Photoresist SubstrateOct 20, 17Aug 08, 19Not available
2019/0187,553 APPARATUS AND METHODS FOR RETICLE CONFIGURATIONDec 18, 17Jun 20, 19SanDisk Technologies LLC
2019/0064,656 OPTICAL MASK FOR USE IN A PHOTOLITHOGRAPHY PROCESS, A METHOD FOR FABRICATING THE OPTICAL MASK AND A METHOD FOR FABRICATING AN ARRAY OF PATTERNS ON A SUBSTRATE USING THE OPTICAL MASKAug 24, 17Feb 28, 19Not available

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Patents Issued To Date - By Filing Year

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