G03F 1/46

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Description

Class  G03F : PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR


Subclass 1/46: Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof Antireflective coatings

Recent Patents

Patent #TitleFiling DateIssue DatePatent Owner
12181791 Extreme ultraviolet mask and method of manufacturing the sameJul 24, 23Dec 31, 24TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
12176211 Reflection mode photomaskJul 21, 23Dec 24, 24TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
12072619 Reflective mask blank, reflective mask, and method for manufacturing reflective mask and semiconductor deviceJun 18, 20Aug 27, 24501 Hoya Corporation
12032295 Optical lithography system and method of using the sameDec 13, 22Jul 09, 24Taiwan Semiconductor Manufacturing Co., Ltd.
12019366 Reflective mask blank, reflective mask, and method for manufacturing reflective mask and semiconductor deviceJun 18, 20Jun 25, 24501 Hoya Corporation
11960211 Optical lithography system and method of using the sameJul 09, 21Apr 16, 24Taiwan Semiconductor Manufacturing Co., Ltd.
11848239 Patterning method and structures resulting therefromJul 10, 20Dec 19, 23Taiwan Semiconductor Manufacturing Co., Ltd.
11817317 High-silicon-content wet-removable planarizing layerOct 26, 20Nov 14, 23Brewer Science Inc.
11774844 Extreme ultraviolet mask and method of manufacturing the sameMar 14, 22Oct 03, 23TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
11735421 Reflection mode photomask and method of makingFeb 08, 22Aug 22, 23TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
11703752 Method of accelerated hazing of mask assemblyMar 25, 21Jul 18, 23TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
11275301 Extreme ultraviolet mask and method of manufacturing the sameAug 02, 19Mar 15, 22Taiwan Semiconductor Manufacturing Co., Ltd.
11270884 Reflection mode photomaskJan 27, 20Mar 08, 22TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
11092884 Mask for extreme-ultraviolet (extreme-UV) lithography and method for manufacturing the sameOct 23, 18Aug 17, 21Interuniversitair Microelektronica Centrum (IMEC VZW)
11009794 Anti-reflection optical substrates and methods of manufactureMar 05, 19May 18, 21ASML Holding N.V.
10983430 Mask assembly and haze acceleration methodFeb 22, 18Apr 20, 21TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
10921705 Mask blank substrate, substrate with multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing semiconductor deviceNov 15, 16Feb 16, 21501 Hoya Corporation
10859902 Lithography mask and methodSep 11, 19Dec 08, 20Taiwan Semiconductor Manufacturing Company Ltd.
10802392 Photomask laser etchJul 12, 19Oct 13, 20Applied Materials Inc.
10741725 Transparent substrate and process for producing itJan 02, 19Aug 11, 20AGC Inc.

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Recent Publications

Publication #TitleFiling DatePub DatePatent Owner
2025/0093,764 EXTREME ULTRAVIOLET MASKNov 27, 24Mar 20, 25Taiwan Semiconductor Manufacturing Company Ltd.
2024/0319,578 REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICEMay 31, 24Sep 26, 24501 Hoya Corporation
2024/0319,609 Optical Lithography System and Method of Using the SameJun 04, 24Sep 26, 24Not available
2024/0142,869 ALUMINUM OXIDE CARBON HYBRID HARDMASKS AND METHODS FOR MAKING THE SAMEAug 24, 23May 02, 24Not available
2024/0142,870 ALUMINUM OXIDE CARBON HYBRID HARDMASKS AND METHODS FOR MAKING THE SAMEAug 24, 23May 02, 24Applied Materials Inc.
2024/0063,060 PATTERNING METHOD AND STRUCTURES RESULTING THEREFROMNov 03, 23Feb 22, 24Not available
2023/0341,761 ANTI-REFLECTION WITH INTERCONNECTED STRUCTURESOct 26, 21Oct 26, 23Not available
2023/0185,184 HARDMASK STRUCTURE FOR PREPARING SEMICONDUCTOR STRUCTUREDec 10, 21Jun 15, 23Not available
2023/0110,529 BLANK MASK AND PHOTOMASK USING THE SAMEOct 05, 22Apr 13, 23SKC solmics Co., Ltd.
2018/0335,692 PHASE-SHIFT BLANKMASK AND PHASE-SHIFT PHOTOMASKMay 09, 18Nov 22, 18S&S TECH CO., LTD.

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