PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrography, sensitive layers or processes G03G)
| Subclass | Title |
|---|---|
| 1/00 | Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof |
| 1/20 | Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof |
| 1/22 | Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Masks or mask blanks for imaging by radiation of 100 nm or shorter wavelength, e.g. X-ray masks, extreme ultra-violet [EUV] masks; Preparation thereof |
| 1/24 | Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Masks or mask blanks for imaging by radiation of 100 nm or shorter wavelength, e.g. X-ray masks, extreme ultra-violet [EUV] masks; Preparation thereof Reflection masks; Preparation thereof |
| 1/26 | Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Phase shift masks [PSM]; PSM blanks; Preparation thereof |
| Patent # | Title | Filing Date | Issue Date | Patent Owner |
|---|---|---|---|---|
| 9,120,117 | Polylactide/silicon-containing block copolymers for nanolithography | Feb 07, 13 | Sep 01, 15 | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM |
| 9,120,120 | Cleaning apparatus and cleaning method, coater/developer and coating and developing method, and computer readable storing medium | Aug 14, 14 | Sep 01, 15 | TOKYO ELECTRON LIMITED |
| 9,120,266 | Apparatus and method of fabricating flat plate display | Jan 05, 15 | Sep 01, 15 | LG DISPLAY CO., LTD. |
| 9,120,288 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for preparing electronic device, and electronic device | Sep 13, 12 | Sep 01, 15 | FUJIFILM CORPORATION |
| 9,120,299 | Aluminum substrates and lithographic printing plate precursors | Oct 25, 13 | Sep 01, 15 | EASTMAN KODAK COMPANY |
| 9,120,726 | Radiation-sensitive resin composition, compound and producing method of compound | Jun 18, 12 | Sep 01, 15 | JSR CORPORATION |
| 9,120,947 | Surface treatments for alignment of block copolymers | Mar 17, 11 | Sep 01, 15 | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM |
| 9,121,101 | Etchant and etching method using the same | Jun 27, 12 | Sep 01, 15 | ASAHI KASEI E-MATERIALS CORPORATION |
| 9,121,788 | Device and method for detecting optical performance of beam shaping element | Jun 28, 11 | Sep 01, 15 | SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS, CHINESE ACADEMY OF SCIENCES |
| 9,121,986 | Microlens array and scanning exposure device using same | Jul 27, 12 | Sep 01, 15 | V TECHNOLOGY CO., LTD. |
| 9,122,147 | Pattern forming process | Jan 16, 14 | Sep 01, 15 | SHIN-ETSU CHEMICAL CO., LTD. |
| 9,122,148 | Master template replication | Oct 28, 09 | Sep 01, 15 | MOLECULAR IMPRINTS, INC., |
| 9,122,149 | Imprint apparatus and method of manufacturing article | Mar 16, 11 | Sep 01, 15 | CANON KABUSHIKI KAISHA |
| 9,122,151 | Resist composition, resist film therefrom and method of forming negative pattern using the composition | Feb 27, 12 | Sep 01, 15 | FUJIFILM CORPORATION |
| 9,122,152 | Patterning process and resist composition | Jun 18, 13 | Sep 01, 15 | SHIN-ETSU CHEMICAL CO., LTD. |
| 9,122,153 | Cyclic compound, method for producing same, composition, and method for forming resist pattern | Aug 09, 12 | Sep 01, 15 | MITSUBISHI GAS CHEMICAL COMPANY, INC. |
| 9,122,154 | Radiation-sensitive resin composition, and radiation-sensitive acid generating agent | Jul 08, 13 | Sep 01, 15 | JSR CORPORATION |
| 9,122,155 | Sulfonium salt, resist composition and patterning process | Dec 11, 13 | Sep 01, 15 | SHIN-ETSU CHEMICAL CO., LTD. |
| 9,122,156 | Composition of matter and molecular resist made therefrom | Oct 21, 14 | Sep 01, 15 | |
| 9,122,157 | Resist composition and method for forming resist pattern | Nov 20, 13 | Sep 01, 15 | TOKYO OHKA KOGYO CO., LTD. |
| Publication # | Title | Filing Date | Pub Date | Patent Owner |
|---|---|---|---|---|
| 2015/0248,051 | MANUFACTURING METHOD OF COLOR FILTER SUBSTRATE | Jun 30, 14 | Sep 03, 15 | CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD., |
| 2015/0248,052 | PHOTORESIST COMPOSITION, COMPOUND AND PROCESS OF PRODUCING PHOTORESIST PATTERN | Mar 02, 15 | Sep 03, 15 | SUMITOMO CHEMICAL COMPANY, LIMITED |
| 2015/0248,053 | PHOTOSENSITIVE CONDUCTIVE PASTE, MULTILAYER SUBSTRATE, METHOD OF PRODUCING CONDUCTIVE PATTERN, AND ELECTROSTATIC CAPACITANCE TYPE TOUCH PANEL | Oct 31, 13 | Sep 03, 15 | TORAY INDUSTRIES, INC. |
| 2015/0248,054 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD OF MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | Apr 29, 15 | Sep 03, 15 | FUJIFILM CORPORATION |
| 2015/0248,055 | PHOTOCURABLE COMPOSITIONS | Aug 06, 13 | Sep 03, 15 | 3M INNOVATIVE PROPERTIES COMPANY |
| 2015/0248,056 | PATTERN FORMING METHOD, MULTI-LAYERED RESIST PATTERN, MULTI-LAYERED FILM FOR ORGANIC SOLVENT DEVELOPMENT, RESIST COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | May 15, 15 | Sep 03, 15 | FUJIFILM CORPORATION |
| 2015/0248,057 | RESIST OVERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME | Aug 30, 13 | Sep 03, 15 | NISSAN CHEMICAL INDUSTRIES, LTD. |
| 2015/0248,058 | CONDUCTIVE PATTERN FABRICATION METHOD | Sep 27, 13 | Sep 03, 15 | TORAY INDUSTRIES, INC. |
| 2015/0248,059 | METHOD OF USING AN EUV MASK DURING EUV PHOTOLITHOGRAPHY PROCESSES | May 13, 15 | Sep 03, 15 | GLOBALFOUNDRIES INC. |
| 2015/0248,060 | METHOD OF MAKING THERMAL INSULATION FILM AND THERMAL INSULATION FILM PRODUCT | Feb 20, 15 | Sep 03, 15 | KONICA MINOLTA LABORATORY U.S.A., INC. |
| 2015/0248,061 | Dynamic optical head layer and lithography method using the same | Mar 02, 15 | Sep 03, 15 | INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY |
| 2015/0248,062 | DIGITAL EXPOSURE METHOD AND DIGITAL EXPOSURE APPARATUS FOR PERFORMING THE SAME | Aug 14, 14 | Sep 03, 15 | SAMSUNG DISPLAY CO., LTD. |
| 2015/0248,063 | PHOTOLITHOGRAPHIC ILLUMINATOR DEVICE ENABLING CONTROLLED DIFFRACTION | Sep 25, 13 | Sep 03, 15 | |
| 2015/0248,064 | SURFACE POSITION DETECTION APPARATUS, EXPOSURE APPARATUS, AND EXPOSURE METHOD | May 14, 15 | Sep 03, 15 | |
| 2015/0248,065 | ILLUMINATION OPTICAL APPARATUS AND PROJECTION EXPOSURE APPARATUS | May 15, 15 | Sep 03, 15 | |
| 2015/0248,066 | ILLUMINATION OPTICAL APPARATUS AND PROJECTION EXPOSURE APPARATUS | May 15, 15 | Sep 03, 15 | |
| 2015/0248,067 | DETERMINATION METHOD, EXPOSURE APPARATUS, EXPOSURE SYSTEM, METHOD OF MANUFACTURING ARTICLE, AND STORAGE MEDIUM | Feb 25, 15 | Sep 03, 15 | CANON KABUSHIKI KAISHA |
| 2015/0248,068 | Method and Structure for Lithography Processes with Focus Monitoring and Control | Mar 03, 14 | Sep 03, 15 | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 2015/0246,478 | NEAR-FIELD EXPOSURE MASK, RESIST PATTERN FORMING METHOD, DEVICE MANUFACTURING METHOD, NEAR-FIELD EXPOSURE METHOD, PATTERN FORMING METHOD, NEAR-FIELD OPTICAL LITHOGRAPHY MEMBER, AND NEAR-FIELD NANOIMPRINT METHOD | Apr 10, 15 | Sep 03, 15 | KABUSHIKI KAISHA TOSHIBA |
| 2015/0241,200 | MULTI-AXIS DIFFERENTIAL INTERFEROMETER | Sep 26, 13 | Aug 27, 15 | MAPPER LITHOGRAPHY IP B.V. |
