G03D

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2 553 US PATENTS IN FORCE
6 US APPLICATIONS PENDING
468 Total Patent Owners
2776 TOTAL INVENTORS

Description

APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS (apparatus specially adapted for photomechanical production of textured or patterned surfaces G03F); ACCESSORIES THEREFOR (photosensitive materials or processes for photographic purposes G03C; electrographic, electrophotographic, or magnetographic methods or apparatus G03G)

Subclasses

Subclass	Title
3/00	Liquid processing apparatus involving immersion; Washing apparatus involving immersion (G03D 9/00, G03D 11/00 take precedence)
3/02	Liquid processing apparatus involving immersion; Washing apparatus involving immersion (G03D 9/00, G03D 11/00 take precedence) Details of liquid circulation
3/04	Liquid processing apparatus involving immersion; Washing apparatus involving immersion (G03D 9/00, G03D 11/00 take precedence) Details of liquid circulation Liquid agitators (in general B01F)
3/06	Liquid processing apparatus involving immersion; Washing apparatus involving immersion (G03D 9/00, G03D 11/00 take precedence) Details of liquid circulation Liquid supply; Liquid circulation outside tanks
3/08	Liquid processing apparatus involving immersion; Washing apparatus involving immersion (G03D 9/00, G03D 11/00 take precedence) having progressive mechanical movement of exposed material

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Recent Patents

Patent #	Title	Filing Date	Issue Date	Patent Owner
9,116,431	Development processing apparatus	Feb 27, 13	Aug 25, 15	KABUSHIKI KAISHA TOSHIBA, KABUSHIKI KAISHA TOSHIBA

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Recent Publications

Publication #	Title	Filing Date	Pub Date	Patent Owner
2015/0241,787	SUBSTRATE PROCESSING METHOD, PROGRAM, COMPUTER-READABLE STORAGE MEDIUM, AND SUBSTRATE PROCESSING SYSTEM	Feb 11, 15	Aug 27, 15	TOKYO ELECTRON LIMITED, TOKYO ELECTRON LIMITED

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Patents Issued To Date - By Filing Year

Average Time to Issuance

24 Months (last 2 years Issuances)
24 Months (last 5 years Issuances)

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G03D

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