Thin film diamond coating system and method

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United States of America

PATENT NO RE50260
SERIAL NO

17900464

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Abstract

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Disclosed herein is a transparent glass system that includes an optical grade silicon substrate, and a nanocrystalline diamond film on the silicon substrate, the diamond film deposited using a chemical vapor deposition system having a reactor in which methane, hydrogen and argon source gases are added. Further disclosed is a method of fabricating transparent glass that includes the steps of seeding an optical grade silicon substrate and forming a nanocrystalline diamond film on the silicon substrate using a chemical vapor deposition system having a reactor in which methane, hydrogen and argon source gases are added.

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Patent Owner(s)

  • AKHAN SEMICONDUCTOR INC

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Khan, Adam Tiburon, US 44 82
Polak, Robert Lindenhurst, US 16 25

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