Methods of forming nanostructures using self-assembled nucleic acids, and nanostructures therof

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United States of America

PATENT NO RE50029
SERIAL NO

17230173

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Abstract

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A method of forming a nanostructure comprises forming a directed self-assembly of nucleic acid structures on a patterned substrate. The patterned substrate comprises multiple regions. Each of the regions on the patterned substrate is specifically tailored for adsorption of specific nucleic acid structure in the directed self-assembly.

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Patent Owner(s)

Patent OwnerAddress
MICRON TECHNOLOGY INCIDAHO IDAHO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Sandhu, Gurtej S Boise, US 1223 33846
Sills, Scott E Boise, US 222 1336

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