Fabrication of nano-sheet transistors with different threshold voltages

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United States of America

PATENT NO RE49954
SERIAL NO

17338459

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Abstract

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A method of forming two or more nano-sheet devices with varying electrical gate lengths, including, forming at least two cut-stacks including a plurality of sacrificial release layers and at least one alternating nano-sheet channel layer on a substrate, removing a portion of the plurality of sacrificial release layers to form indentations having an indentation depth in the plurality of sacrificial release layers, and removing a portion of the at least one alternating nano-sheet channel layer to form a recess having a recess depth in the at least one alternating nano-sheet channel layers, where the recess depth is greater than the indentation depth.

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Patent Owner(s)

Patent OwnerAddress
ADEIA SEMICONDUCTOR SOLUTIONS LLC3025 ORCHARD PARKWAY SAN JOSE CA 95134

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Balakrishnan, Karthik White Plains, US 339 2298
Cheng, Kangguo Schenectady, US 3099 32749
Hashemi, Pouya White Plains, US 602 5206
Reznicek, Alexander Troy, US 1451 12717

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