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United States of America

PATENT NO RE49952
SERIAL NO

16838976

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A sub-beam aperture array for forming a plurality of sub-beams from one or more charged particle beams. The sub-beam aperture array comprises one or more beam areas, each beam area comprising a plurality of sub-beam apertures arranged in a non-regular hexagonal pattern, the sub-beam apertures arranged so that, when projected in a first direction onto a line parallel to a second direction, the sub-beam apertures are uniformly spaced along the line, and wherein the first direction is different from the second direction. The system further comprises a beamlet aperture array with a plurality of beamlet apertures arranged in one or more groups. The beamlet aperture array is arranged to receive the sub-beams and form a plurality of beamlets at the locations of the beamlet apertures of the beamlet array.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VP O BOX 324 5500 AH VELDHOVEN

International Classification(s)

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  • 2020 Application Filing Year
  • H01J Class
  • 2540 Applications Filed
  • 1680 Patents Issued To-Date
  • 66.15 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances2020202120222023202420250255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kuiper, Vincent Sylvester The Hague, NL 28 84
Slot, Erwin Zoetermeer, NL 21 88

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Patent Citation Ranking

  • 0 Citation Count
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Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges397216101 - 10025050075010001250150017502000225025002750300032503500375040004250

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