Apparatus of plural charged-particle beams

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United States of America Patent

PATENT NO RE49784
SERIAL NO

17005212

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Abstract

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A new multi-beam apparatus with a total FOV variable in size, orientation and incident angle, is proposed. The new apparatus provides more flexibility to speed the sample observation and enable more samples observable. More specifically, as a yield management tool to inspect and/or review defects on wafers/masks in semiconductor manufacturing industry, the new apparatus provide more possibilities to achieve a high throughput and detect more kinds of defects.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VP O BOX 324 VELDHOVEN 5500 AH

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Zhong-wei San Jose, US 53 745
Hu, Xuerang San Jose, US 56 295
Liu, Xuedong San Jose, US 123 844
Ren, Weiming San Jose, US 116 788

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