Charged particle lithography system with alignment sensor and beam measurement sensor

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO RE49732
SERIAL NO

16427228

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Abstract

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A multi-beamlet charged particle beamlet lithography system for transferring a pattern to a surface of a substrate. The system comprises a projection system (311) for projecting a plurality of charged particle beamlets (7) onto the surface of the substrate; a chuck (313) moveable with respect to the projection system; a beamlet measurement sensor (id='REI-00001' date='20231121' i.a.id='REI-00001' id='REI-00002' date='20231121' i.e., id='REI-00002' 505, 511) for determining one or more characteristics of one or more of the charged particle beamlets, the beamlet measurement sensor having a surface (501) for receiving one or more of the charged particle beamlets; and a position mark measurement system for measuring a position of a position mark (610, 620, 635), the position mark measurement system comprising an alignment sensor (361, 362). The chuck comprises a substrate support portion for supporting the substrate, a beamlet measurement sensor portion (460) for accommodating the surface of the beamlet measurement sensor, and a position mark portion (470) for accommodating the position mark.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VP O BOX 324 VELDHOVEN 5500 AH

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kuiper, Vincent Sylvester The Hague, NL 28 84
Meijer, Jan Andries Rotterdam, NL 5 15
Scheffers, Paul IJmert Delft, NL 9 14
Slot, Erwin Zoetermeer, NL 21 88
Vergeer, Niels Rotterdam, NL 22 152

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