Lithography system, sensor and measuring method

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United States of America Patent

PATENT NO RE49602
SERIAL NO

16896953

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Abstract

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Lithography system, sensor and method for measuring properties of a massive amount of charged particle beams of a charged particle beam system, in particular a direct write lithography system, in which

    the charged particle beams are converted into light beams by using a converter element,using an array of light sensitive detectors such as diodes, CCD or CMOS devices, located in line with said converter element, for detecting said light beams,electronically reading out resulting signals from said detectors after exposure thereof by said light beams,utilizing said signals for determining values for one or more beam properties, thereby using an automated electronic calculator, andelectronically adapting the charged particle system so as to correct for out of specification range values for all or a number of said charged particle beams, each for one or more properties, based on said calculated property values.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VP O BOX 324 VELDHOVEN 5500 AH

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kruit, Pieter Delft, NL 103 1318
Slot, Erwin Zoetermeer, NL 21 88
Steenbrink, Stijn Willem Herman Karel Den Hague, NL 34 330
Teepen, Tijs Frans Tilburg, NL 6 80
Wieland, Marco Jan-Jaco Delft, NL 104 1084

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