Lithographic apparatus and an object positioning system

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United States of America Patent

PATENT NO RE49142
SERIAL NO

16590895

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Abstract

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A lithographic apparatus id='REI-00001' date='20220719' comprisingid='REI-00001' id='REI-00002' date='20220719' includes id='REI-00002' an object table id='REI-00003' date='20220719' which carries an objectid='REI-00003' . The lithographic apparatus may further id='REI-00004' date='20220719' comprise at least oneid='REI-00004' id='REI-00005' date='20220719' include a id='REI-00005' sensor id='REI-00006' date='20220719' as part of a measurement systemid='REI-00006' to measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimate id='REI-00007' date='20220719' theid='REI-00007' id='REI-00008' date='20220719' a id='REI-00008' deformation of id='REI-00009' date='20220719' theid='REI-00009' id='REI-00010' date='20220719' an id='REI-00010' object due to id='REI-00011' date='20220719' a id='REI-00011' varying id='REI-00012' date='20220719' loadsid='REI-00012' id='REI-00013' date='20220719' load id='REI-00013' during operation of the lithographic apparatus, for example id='REI-00014' date='20220719' a id='REI-00014' varying id='REI-00015' date='20220719' loadsid='REI-00015' id='REI-00016' date='20220719' load id='REI-00016' induced by a two-phase flow in a channel formed id='REI-00017' date='20220719' withinid='REI-00017' id='REI-00018' date='20220719' of id='REI-00018' the object table. id='REI-00019' date='20220719' Additionally, or alternatively, theid='REI-00019' id='REI-00020' date='20220719' The id='REI-00020' lithographic apparatus id='REI-00021' date='20220719' comprisesid='REI-00021' id='REI-00022' date='20220719' may include id='REI-00022' a predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation. The positioning of a projection beam, used to id='REI-00023' date='20220719' provide a id='REI-00023' pattern id='REI-00024' date='20220719' a substrateid='REI-00024' , can be controlled relative to the object, to alter the position of the pattern and/or the projection beam on the substrate, based on the estimated deformation.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VP O BOX 324 VELDHOVEN 5500 AH

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Berendsen, Christianus Wilhelmus Johannes Roermond, NL 13 18
Bloks, Ruud Hendrikus Martinus Johannes Helmond, NL 28 90
Cortie, Rogier Hendrikus Magdalena Ittervoort, NL 36 340
Koevoets, Adrianus Hendrik Mierlo, NL 29 112
Kunnen, Johan Gertrudis Cornelis Weert, NL 35 290
Laurent, Thibault Simon Mathieu Eindhoven, NL 43 333
Neefs, Patricius Jacobus Raamsdonksveer, NL 5 10
Overkamp, Jim Vincent Eindhoven, NL 23 68
Renders, Michael Johannes Hendrika Wilhelmina Eindhoven, NL 2 6
Saputra, Putra Delft, NL 7 8

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